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Chemical Vapor Deposition Equipment


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     Offered (box) or Wanted (coins)  Item ID  Photo Short Description Product Type / Details # Price Notes Location
    Make Model
      $  
    109694
    12-inch (300mm) HFCVD System for CVD Diamond & Related Materials  

    List all items of this typeChemical Vapor Deposition Equipment - Other

    in Chemical Vapor Deposition Equipment

    1 F* Sterling, MA
    12-inch (300mm) HFCVD System for CVD Diamond & Related Materials
    • Hot Filament CVD system engineered for diamond deposition on a 12 inch (~300mm) rotary platen.
    • Design offers excellent potential for diamond, CNTs & related nanomaterials processing for both R&D and/or production.

      This equipment was engineered and used by an industrial entity for commercial CVD production using a hydrogen-based process. 2-chamber system design includes loading chamber and HFCVD hot zone separated by large gate valve. This design enables continuous operation of filaments for many days without shutdown. Equipment employs a 4-zone filament array with independent controls for each zone. Rotary stage maximizes deposition uniformity. Large HFCVD hot zone and push rod design enable substrate-to-filament distance control. Refractory metal filaments can operate at >2000C and enable thermal decomposition of H2 and hydrocarbons into activated species. Specialty, water-cooled MDC chambers maintain low temperature chamber wall while substrate is heated to elevated temperatures via atomic hydrogen recombination and radiational heating.

      Deposition over >12 inch diameter or coating on 3-D shapes should be viable with process and fixture development.

      Images of a typical HFCVD system installation are attached.
    115857
    4-inch HFCVD System for CVD Diamond and Related Materials 

    List all items of this typeChemical Vapor Deposition Equipment - Other

    in Chemical Vapor Deposition Equipment

    1 F* Sterling, MA
    4-inch HFCVD System for CVD Diamond and Related Materials
    • Hot Filament CVD system engineered for diamond deposition on a 4 inch (~100mm) rotary platen.
    • System design offers excellent potential for diamond, CNTs & related nanomaterials processing for both R&D and/or production.

    This equipment was previously used for commercial R&D of polycrystalline CVD Diamond materials.

    Design employs a 2-zone vertically-oriented filament array with independent controls for each zone. Rotary stage maximizes deposition uniformity. External substrate manipulation enables substrate-to-filament distance control. Refractory metal filaments can operate at >2000C and enable thermal decomposition of H2 and hydrocarbons into activated species.

    Cline Innovations intends to refurbish and reintegrate this system with updated controls and interlocks, likely including PLC process monitoring, LCD display, pneumatic controls, and other features.  Tailoring of design to meet customer needs may be possible.  Run-off testing is possible prior to shipment.

    177729

    Applied Materials  

    P5000 

    List all items of this typeChemical Vapor Deposition Equipment - Other

    in Chemical Vapor Deposition Equipment

    1 F* Regensburg, BY
    AMAT P5000 - PE Oxide Dep - 6"
    AMAT P5000 - PE Oxide Dep Tool
    2 DxZ Chamber - Both PE - Silane 6" Si
    Currently Installed in Fab, Good Working Condition
    190527

    Applied Materials  

    P5000 

    List all items of this typeChemical Vapor Deposition Equipment - Other

    in Chemical Vapor Deposition Equipment

    1 N* Singapore,
    AMAT P5000-Mark II, 200mm, TEOS Dep

    AMAT P5000-Mark II, 200mm, TEOS Dep, DCVD 

    S/N: 5000-5104

    189129

    Applied Materials  

    P5000 

    List all items of this typeChemical Vapor Deposition Equipment - Other

    in Chemical Vapor Deposition Equipment

    1 Singapore,
    AMAT P5000-Mark II, 200mm, TEOS Dep- Etch Back
    AMAT P5000-Mark II, 200mm, TEOS Dep- Etch Back

    S/N: 5000-4326
    189087

    Applied Materials  

    P5000 

    List all items of this typeChemical Vapor Deposition Equipment - Other

    in Chemical Vapor Deposition Equipment

    1 Singapore,
    AMAT, P5000, PECVD, 200mm, Passivation Dep System
    AMAT, P5000, PECVD, 200mm, Passivation Dep System

    In the Fab
    56326

    Applied Materials  

    P5000 

    List all items of this typeCluster PECVD Tools

    in Production Tools

    1 F* Scotia, NY
    APPLIED MATERIALS AMAT P5000 MARK II SYSTEM
    AMAT P5000 Mark II Hybrid System.
    Two MxP Etch Chambers, One PECVD Nitride Chamber. Phase III handling system. 28-line onboard gas panel.
    Integrated endpoint system with 2 monochromators.
    Currently configured for 100mm wafers.


    System is fully configurable to your specifications..
    23215

    Applied Materials  

    P5000 MARK II 

    List all items of this typeCluster PECVD Tools

    in Production Tools

    1 F* Scotia, NY
    APPLIED MATERIALS AMAT TEOS DEPOSITION, OXID ETCH, P5000
    Mark II System
    TEOS Deposition, Oxide Etch
    187764

    Applied Materials  

    P5000 

    List all items of this typeChemical Vapor Deposition Equipment - Other

    in Chemical Vapor Deposition Equipment

    1 Singapore,
    Applied Materials P5000 Etch-Depostion, 200mm,
    Applied Materials P5000 Etch-Depostion, 200mm
    Still in the Fab.
    183417

    ASM  

    A412 Dual Reactor  

    List all items of this typeVertical LPCVD Furnaces

    in LPCVD Furnaces

    1 F* Malta, New York
    ASM A412 Vertical Furnace, 300mm, LPCVD As Dpoed Poly / TiN
    ASM A412 Vertical Furnace, 300mm, LPCVD As Dpoed Poly / TiN
    Twin LPCVD As Doped Reactors

    TOOL ID: FVX2560

    Chemistry TiCl4, NH3, NF3, Cl2, SiH4, AsH4

    2011 Vintage

     

    Tool ID: FVX2560

    183418

    ASM  

    A412 Dual Reactor  

    List all items of this typeVertical LPCVD Furnaces

    in LPCVD Furnaces

    1 F* Malta, New York
    ASM A412 Vertical Furnace, 300mm, LPCVD As Dpoed Poly / TiN
    ASM A412 Vertical Furnace, 300mm, LPCVD As Doped Poly / TiN
    Twin LPCVD As Doped Reactors

    TOOL ID: FVX2561

    Chemistry TiCl4, NH3, NF3, Cl2, SiH4, AsH4

    2011 Vintage

     

    Tool ID: FVX2561

    181651

    ASM  

    A412 

    List all items of this typeVertical LPCVD Furnaces

    in LPCVD Furnaces

    1 F* Taichung, Taichung City
    ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN
    ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN
    Dual Furnace LPCVD Reactor
    Reactor A is LPCVD SiN (DCS) DF-NDP-12
    Reactor B is LPCVD SiN (DCS) DF-NDP-14

    183169

    ASM  

    A412 

    List all items of this typeVertical LPCVD Furnaces

    in LPCVD Furnaces

    1 F* Malta, NY
    ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN
    ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN
    Twin LPCVD SiN Reactors

    TOOL ID: FVX2541

    2011 Vintage
    183170

    ASM  

    A412 

    List all items of this typeVertical LPCVD Furnaces

    in LPCVD Furnaces

    1 Malta, New York
    ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN
    ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN
    Twin LPCVD SiN Reactors

    TOOL ID: FVX2540

    2011 Vintage

     

    Tool ID: FVX2541

     
    181649

    ASM  

    A412 

    List all items of this typeVertical LPCVD Furnaces

    in LPCVD Furnaces

    1 Taichung, Taichung City
    ASM A412 Vertical Furnace, 300mm, LPCVD SiN & TEOS
    Manufactured in 2005; Status: Bagged and Skidded
    A412 Smart Batch
    Dual reactor LPCVD.
    Reactor A is LPCVD TEOS Oxide deposition
    Reactor B is LPCVD Silicon Nitride
    S/N: 30245
    178276

    ASM  

    A412 

    List all items of this typeVertical LPCVD Furnaces

    in LPCVD Furnaces

    1 F* Taichung, Taichung City
    ASM, A412 Ovens / Furnaces, 300mm
    Manufactured in 2005; Status: Bagged and Skidded
    Dual reactor LPCVD.
    Reactor A is LPCVD Silicon Nitride
    Reactor B is Phos Doped Poly silicon
    S/N: 30236

    184607

    Astex  

    AX5000, AX6000, AX6350 or similar 

    List all items of this typeSingle Chamber PECVD Tools

    in Production Tools

    1 F* Leominster, MA
    Astex AX5000 Microwave Plasma Diamond Growth System
    • Multiple stainless steel, Astex microwave plasma CVD chambers and plasma couplers currently available as the basis for refurbishment and reintegration.
    • Systems can be reintegrated based on customer's application needs using a combination of reliable, new and used/refurbished components.
    • This general system type enables growth of nanocrystalline. polycrystalline, or single crystal diamond (SCD) depending on configuration and operating conditions.
    • 1.5kW to 5kW microwave power input.
    • 3 stage options: Cooled, Heated, or Thermally Floating.
    • Computer controls.
    189843

    Astex  

    AX6500 "Clamshell" MPCVD 

    List all items of this typeSingle Chamber PECVD Tools

    in Production Tools

    1 F*N* Leominster, Massachusetts
    Astex AX6500 Diamond Growth System
    • Microwave Plasma CVD (MPCVD) "Clamshell" diamond deposition system designed & produced by Astex.
    • Capable of high rate single-crystal (SCD) diamond homoepitaxy as well as growth of polycrystalline, nanocrystalline (NCD), ultrananocrystalline diamond (UNCD).
    • System to be refurbished & updated with modernized computer controls, higher throughput water cooling subsystem, and enhanced process control/monitoring devices.
    • The AX6500 employs a unique, bottom-launched microwave plasma apparatus rated for up to 8kW of 2.45GHz microwave input.
    • Top-loaded, water-cooled aluminum chamber with water-cooled stage. Copper stage is typically shielded with special fixtures during plasma processing.
    • This system can be customized to meet customer needs and preferences.  Please contact Cline Innovations for details.
    137483

    Astex  

    ECR-MOCVD-PECVD 

    List all items of this typeSingle Chamber PECVD Tools

    in Production Tools

    1 F* Leominster, MA
    ASTeX Large Volume Plasma Processing System (ECR-PECVD-MPCVD-MOCVD)
    High density plasma system activated by 2.45GHz ECR microwave offers low temperature plasma for PECVD-MOCVD deposition, functionalization, and/or dry etching of ceramics, diamond & related carbon materials, and nanomaterials.

    Computer-Controlled, low pressure, high power-density, microwave plasma system equipped with a large 28-inch dia X 51-inch long cylindrical SS chamber with full-diameter doors on each end and many ISO 150 & 250 flanges. Two Astex 2.5kW to 5KW microwave generators are used to power two permanent-magnet high-power ECR (Electron Cyclotron Resonance) sources. A planetary motion feedthrough is mounted on the top of the chamber and is equipped with RF-bias functionality (if needed) and planetary fixturing. Flexible system design is currently configured for simultaneous, high-rate, PECVD-MOCVD deposition of ceramic oxides onto many 3-D parts using gas, vapor and liquid reactants and no external heating.

    Potential future uses range from large area/volume MOCVD/PECVD/deposition of ceramics/semiconductors/DLC/nanodiamond/nanomaterials, surface treatment & functionalization and/or dry etching.

    This is a flexible R&D or semi-production system that was originally installed in the 1999 timeframe and used for high deposition-rate oxide PECVD/MOCVD research for less than 3-½ years. Most, if not all, of the research was focused on silicon oxide studies with rates measured in the micron/minute range using up to 10KW (2 X 5KW) of microwave power input enhanced with two ECR magnets.

    137544

    Aviza Technology Ltd  

    Aviza Celsior mainframe for 12" / 300 mm 

    List all items of this typeBenchtop LPVCD Furnaces

    in LPCVD Furnaces

    1 F* Regensburg, BY
    Aviza Celsior mainframe
    Aviza Celsior mainframe



    Aviza Celsior mainframe
    Equipment Code: CVD304-04

    LOCATION: Dresden
    137540

    Aviza Technology Ltd  

    Aviza Pantheon Mainframe for 12" / 300 mm 

    List all items of this typeBenchtop LPVCD Furnaces

    in LPCVD Furnaces

    1 F* Regensburg, BY
    Aviza Pantheon Mainframe
    Aviza Pantheon Mainframe
    Equipment Code: CVD304-03


    Aviza Pantheon Mainframe with 3 chambers
    Serial Number: OX0412-005
    98056

    Carbone  

    G-III 

    List all items of this typeEpitaxial Cluster Tools

    in Epitaxial Reactors

    5 F* Scotia, NY
    CARBONE SILICON CARBIDE 200mm DISC SUSCEPTOR
    Silicon Carbide 200 mm Disc Susceptor

    Carbone of America Part number 017893-001
    187926

    Cline Innovations  

    Custom CVD Diamond System 

    List all items of this typeSingle Chamber PECVD Tools

    in Production Tools

    1 F* Leominster, MA
    Custom CVD Diamond Systems

    Cline Innovations is now designing and building custom microwave plasma CVD systems for technically discerning customers.  Please contact us to discuss your advanced CVD diamond process specifications.

    137566

    Tokyo Electron Ltd  

    OfenTel Minibatch (NITRID) for 12" / 300 mm 

    List all items of this typeVertical LPCVD Furnaces

    in LPCVD Furnaces

    1 F* Regensburg, BY
    Furnace TEL Minibatch (NITRID)
    OfenTel Minibatch (NITRID)
    Equipment Code: OFE361-01

    TEL Formula Minibatch furnace for Nitride, 4


    OfenTel Minibatch (NITRID)
    Serial Number: P00000315001
    137567

    Tokyo Electron Ltd  

    OfenTel Minibatch (OXID) for 12" / 300 mm 

    List all items of this typeVertical LPCVD Furnaces

    in LPCVD Furnaces

    1 F* Regensburg, BY
    FurnaceTel Minibatch (OXID)
    OfenTel Minibatch (OXID)
    Equipment Code: OFE361-02

    TEL Formula Minibatch furnace for Oxide


    OfenTel Minibatch (OXID)
    Serial Number: P00000315002
    190993

    Kokusai  

    Quixace Ultimate 

    List all items of this typeVertical LPCVD Furnaces

    in LPCVD Furnaces

    1 F*N* Malta, New York
    Kokusai Quixace Ultimate, 300mm, DJ-1236VN-DF

    Kokusai Quixace Ultimate, 300mm, DJ-1236VN-DF

    Low Temp Steam Anneal - for SOD Cure

    S/N: T2DD6-18711

    190748

    Kokusai  

    DJ-1236VN-DF 

    List all items of this typeVertical LPCVD Furnaces

    in LPCVD Furnaces

    1 N* Malta, New York
    Kokusai Quixace Ultimate, 300mm, DJ-1236VN-DF, ALD-TiN
    Kokusai Quixace Ultimate, 300mm,  DJ-1236VN-DF

    S/N T2DC6-16590

    ALD TiN

    Tool is New In Box, with New Quartz.  Never installed.
    190749

    Kokusai  

    DJ-1236VN-DF 

    List all items of this typeVertical LPCVD Furnaces

    in LPCVD Furnaces

    1 N* Malta, New York
    Kokusai Quixace Ultimate, 300mm, DJ-1236VN-DF, ALD-TiN
    Kokusai Quixace Ultimate, 300mm,  DJ-1236VN-DF

    S/N: T2DC6-16595

    ALD TiN
    180506

    Kokusai  

    DJ-1236VN-DF 

    List all items of this typeVertical LPCVD Furnaces

    in LPCVD Furnaces

    1 F* Dresden, SN
    Kokusai Quixace Ultimate, 300mm, MT-TiN, DJ-1236VN-DF
    Kokusai Quixace Ultimate, 300mm, MT-TiN, DJ-1236VN-DF
    TiCl4, NH3 - Process for TiN - Prior Use

    Cartridge Heater - D4EX22250, RHC2 Heater
    Number of control zone, 5 zones
    Heater element material - KANTHAL APM
    Maximum heating temperature range - 1050 degC (in Furnace)
    Flat zone length - 800mm (±2.0 degC at 800 degC)
    Main Controller(OU) - D4EX38403(KDSC-2007CONT), Made by HKDE
    Core2Duo 2.16GHz, 2.0GB, 80GB (RAID1), 100BASE-TX 3Ch, USB2.0
    Main Operation Unit - TM150-HKT05 
    Sub Operation Unit - D4EX40577
    Bottle Heater (For Ta Source) - E-0456-17, Tokyo Gikken
    Bottle Heater (For Ta Source) - E-0456-17, Made by Tokyo Gikken
    Bubbling UNIT (For Ti Source) - D4EX31240, Made by Schumacher
    Bottle (For Ti Source) - BK1200URK, Made by Schumacher
    N2 Purge Load Lock System
    O2 Monitor / Detector - SH-305(RX-501052), Made by ENEGY SUPPORT
    FOUP Opener N2 Purge SYSTEM - Made by HITACHI KOKUSAI

    S/N: T2DC6-15901
    190750

    Kokusai  

    DD-1223VN 

    List all items of this typeVertical LPCVD Furnaces

    in LPCVD Furnaces

    1 F*N* Malta, New York
    Kokusai Quixace, 300mm, DD-1223VN, ALD-TiN
    Kokusai Quixace, 300mm, DD-1223VN

    ALD-TiN 

    S/N T2DC6-16441
    186717

    Kokusai  

    DJ-853V 

    List all items of this typeVertical LPCVD Furnaces

    in LPCVD Furnaces

    1 F* Singapore,
    Kokusai, 200mm, DJ-853V, LPCVD SiN S
    Kokusai, 200mm, DJ-853V, LPCVD SiN 

    100429

    Materials Technology  

    02-01808 

    List all items of this typeEpitaxial Cluster Tools

    in Epitaxial Reactors

    4 F* Scotia, NY
    MATERIALS TECHNOLOGY CORPORATION BARREL SUSCEPTOR
    EPI 3 1/4" Barrel Susceptor

    MTC EPI Reactor Parts
    For 3 Inch Wafers
    11074

    Nexx Systems  

    Cirrus 300 

    List all items of this typeSingle Chamber PECVD Tools

    in Production Tools

    1 F* Scotia, NY
    NEXX SYSTEMS ECR PECVD RIE SYSTEM
    Low Temperature CVD Using ECR Technology. Formerly PlasmaQuest Astex

    This system is designed for the fluorination of DLC surfaces on various substrates.
    The ECR zone is produced by a Nd-Fe-B permanent magnet which produces a high magnetic field launch of the microwave energy.
    High magnetic field launch produces a highly stable and efficient ECR plasma.

    Nexx Systems Cirrus 300

    181540

    Oxford Instruments  

    Plasmalab System 100 

    List all items of this typeSingle Chamber PECVD Tools

    in Production Tools

    1 F* Scotia, NY
    OXFORD INSTRUMENTS PLASMALAB 100 PECVD
    PECVD TEOS Tool with Load Lock
    191492

    Picosun  

    Sunale R-200 

    List all items of this typeChemical Vapor Deposition Equipment - Other

    in Chemical Vapor Deposition Equipment

    1 F*N* East Fishkill, New York
    Picosun, Sunale R-200, Advanced ALD Reactor, 300mm
    Picosun, Sunale R-200, Advanced ALD Reactor, 300mm

    Configured with three canisters and chemicals to deposit Ni, HfO, Ru and SiO, Al

    SUNALETM R-200 Advanced ALD System
    The ALD reactor has six separate inlets for precursor sources. It can accommodate up to twelve precursor sources. Maximum deposition temperature of the ALD reactor is 500 °C.

     Vacuum chamber (AISI304)

    AISI 304 stainless steel vessel with KF/CF connection flanges for RC-200 reaction chamber.

    Reaction Chamber (AISI316L)
    RC-200 Chamber and lid with metal sealing surface. Customer specified chamber size up to 8”single Si wafer or smaller wafers (4”, 6”) and pieces

    Sample holder SH-200
    Substrate holder for one up to 8” wafer or smaller wafers (4”, 6”) and pieces compatible with reaction chamber

    Advanced source control and electronics system
    Touch panel PC and electronics cabinet used for operating the ALD reactor with Advanced 12-source ALD software and electronics

    PicosolutionTM 600 source system

    Cooled source systems for high vapor pressure liquid precursors (e.g. for TMA, TiCl4 and H2O). Maximum capacity 600mL. 3ea.

    Boosted PicohotTM 200 source system

    Heated source systems (up to 200 °C) for low vapor pressure metal precursors (e.g. for TEMAHf, TEMAZr). Suitable also for high vapor pressure chemicals.  2ea.

    PicohotTM 300 source system

    Heated source system (up to 300 °C) for low vapor pressure metal precursors (e.g. for HfCl4, ZrCl4).  1ea.

    PicogasesTM Connection

    Allows for the connection of an additional externally supplied compressed gas for use as an ALD precursor (e.g. NH3, O2). Includes plumbing, valves, and control of extra gas source.

    DOM:6/18/2013

    147470

    Plasma-Therm  

    790 PECVD 11" 

    List all items of this typeSingle Chamber PECVD Tools

    in Production Tools

    1 F* Scotia, NY
    PLASMATHERM PECVD 790
    Refurbished PECVD System with 11" Electrode
    30246

    Plasma-Therm  

    VLR 700 VLR-PM1-ICRB-PM 

    List all items of this typeCluster PECVD Tools

    in Production Tools

    1 F* Scotia, NY
    PLASMATHERM VLR 700
    Single Chamber PECVD. Mixed Frequency Deposition
    (MFD) Both High Frequency (13.56 MHz) and Low Frequency (50-460 kHz)
    RF power delivered both electrodes.
    183107

    Applied Materials  

    Producer GT 

    List all items of this typeChemical Vapor Deposition Equipment - Other

    in Chemical Vapor Deposition Equipment

    1 East Fishkill, NY
    Producer GT, AMAT, 300mm, CVD, 2 chambers CVD Co, Nblok
    Producer GT, AMAT, 300mm, CVD
    CHB - Nblok
    CHC- CVD Co

    Serial Number 426533

    Tool ID : JN08

    Current Status: Installed and Idle
    188431

    Aviza Technology Ltd  

    AVP 8000 AP 

    List all items of this typeVertical LPCVD Furnaces

    in LPCVD Furnaces

    1 Singapore,
    SVG, AVP 8000 AP, 200mm Vertical Furnace
    SVG, AVP 8000 AP, 200mm Vertical Furnace
    Cu Anneal




    S/N 4250
    189077

    Silicon Valley Group  

    AVP 8000 AP 

    List all items of this typeVertical LPCVD Furnaces

    in LPCVD Furnaces

    1 Singapore,
    SVG, AVP 8000 AP, 200mm Vertical Furnace
    SVG, AVP 8000 AP, 200mm Vertical Furnace

    Padox/Sacri-Ox

    Bagged & Skidded in Warehouse


    188435

    Aviza Technology Ltd  

    AVP 8000 AP 

    List all items of this typeVertical LPCVD Furnaces

    in LPCVD Furnaces

    1 Singapore,
    SVG, AVP 8000 AP, 200mm Vertical Furnace
    SVG, AVP 8000 LP, 200mm Vertical Furnace

    Padox/Sacri-Ox

    S/N: 4318
    191257

    Silicon Valley Group  

    AVP 8000, AP, Forming Gas Anneal 

    List all items of this typeVertical LPCVD Furnaces

    in LPCVD Furnaces

    1 N* Singapore,
    SVG, AVP 8000 AP, 200mm Vertical Furnace, Forming Gas Anneal
    SVG, AVP 8000 AP, 200mm Vertical Furnace, Forming Gas Anneal

    S/N: 4437
    191913

    Silicon Valley Group  

    AVP 8000 AP 

    List all items of this typeVertical LPCVD Furnaces

    in LPCVD Furnaces

    1 N* Singapore,
    SVG, AVP 8000 AP, 200mm Vertical Furnace, Gate Oxidation

    SVG, AVP 8000 AP, 200mm Vertical Furnace, Gate Oxidation

    Bagged & Skidded in Warehouse


    188436

    Aviza Technology Ltd  

    AVP 8000 AP 

    List all items of this typeVertical LPCVD Furnaces

    in LPCVD Furnaces

    1 Singapore,
    SVG, AVP 8000 LP, 200mm Vertical Furnace
    SVG, AVP 8000 LP, 200mm Vertical Furnace

    Padox/Sacri-Ox

    S/N: 4404
    188481

    Aviza Technology Ltd  

    AVP 8000 LP 

    List all items of this typeVertical LPCVD Furnaces

    in LPCVD Furnaces

    1 F* Singapore,
    SVG, AVP 8000 LP, 200mm Vertical Furnace
    SVG, AVP 8000 LP, 200mm Vertical Furnace

    LPCVD Poly (Plain Poly)

    S/N: 4302
    188482

    Aviza Technology Ltd  

    AVP 8000 LP 

    List all items of this typeVertical LPCVD Furnaces

    in LPCVD Furnaces

    1 Singapore,
    SVG, AVP 8000 LP, 200mm Vertical Furnace
    SVG, AVP 8000 LP, 200mm Vertical Furnace

    LPCVD Plain Poly

    S/N: A10092
    188483

    Aviza Technology Ltd  

    AVP 8000 LP 

    List all items of this typeVertical LPCVD Furnaces

    in LPCVD Furnaces

    1 Singapore,
    SVG, AVP 8000 LP, 200mm Vertical Furnace
    SVG, AVP 8000 LP, 200mm Vertical Furnace

    LPCVD TEOS

    S/N: 4436
    189132

    Silicon Valley Group  

    AVP 8000 LP 

    List all items of this typeVertical LPCVD Furnaces

    in LPCVD Furnaces

    1 Singapore,
    SVG, AVP 8000 LP, 200mm Vertical Furnace
    SVG, AVP 8000 LP, 200mm Vertical Furnace

    LPCVD Nitride-Pad/SPCR (Gen Nit)

    Bagged & Skidded in warehouse
    188432

    Aviza Technology Ltd  

    AVP 8000 LP 

    List all items of this typeVertical LPCVD Furnaces

    in LPCVD Furnaces

    1 Singapore,
    SVG, AVP 8000 LP, 200mm Vertical Furnace
    SVG, AVP 8000 LP, 200mm Vertical Furnace

    LPCVD Nitride-Pad/SPCR (Gen Nit)


    S/N: 4359

    188433

    Aviza Technology Ltd  

    AVP 8000 LP 

    List all items of this typeVertical LPCVD Furnaces

    in LPCVD Furnaces

    1 Singapore,
    SVG, AVP 8000 LP, 200mm Vertical Furnace
    SVG, AVP 8000 LP, 200mm Vertical Furnace

    LPCVD Nitride-Pad/SPCR (Gen Nit)


    S/N: 4434

     

    188434

    Aviza Technology Ltd  

    AVP 8000 LP 

    List all items of this typeVertical LPCVD Furnaces

    in LPCVD Furnaces

    1 F* Singapore,
    SVG, AVP 8000 LP, 200mm Vertical Furnace
    SVG, AVP 8000 LP, 200mm Vertical Furnace

    LPCVD Nitride-ONO

    S/N: A10078
    191270

    Silicon Valley Group  

    AVP 8000 LP, SiN 

    List all items of this typeVertical LPCVD Furnaces

    in LPCVD Furnaces

    1 F*N* Singapore,
    SVG, AVP 8000 LP, 200mm Vertical Furnace, LPCVD SiN
    SVG, AVP 8000 LP, 200mm Vertical Furnace

    LPCVD Nitride-Pad/SPCR (Gen Nit)

    S/N: 4321
    178238

    SVG  

    WJ TEOS 1500 

    List all items of this typeAtmospheric Pressure CVD Tools

    in Chemical Vapor Deposition Equipment

    1 Singapore,
    SVG, CVD, WJ TEOS 1500 200mm
    Manufactured in 2008; Status: Bagged and Skidded
    187653

    Tokyo Electron Ltd  

    Alpha 8 S 

    List all items of this typeAtmospheric Pressure CVD Tools

    in Chemical Vapor Deposition Equipment

    1 Singapore,
    TEL Alpha 8 S, 200mm, Vertical Furnace

    TEL Alpha 8 S, 200mm, Vertical Furnace

    TEL Alpha 8 S, 200mm, Vertical Furnace, 

    LINE BUY TOOL ___  NO CONFIGURATION INFORMATION AVAILABLE


    S/N: A00009820055

    Bagged & Skidded in Warehouse
    187654

    Tokyo Electron Ltd  

    Alpha 8 S 

    List all items of this typeAtmospheric Pressure CVD Tools

    in Chemical Vapor Deposition Equipment

    1 Singapore,
    TEL Alpha 8 S, 200mm, Vertical Furnace

    TEL Alpha 8 S, 200mm, Vertical Furnace

    TEL Alpha 8 S, 200mm, Vertical Furnace, 

    LINE BUY TOOL ___  NO CONFIGURATION INFORMATION AVAILABLE


    S/N: A00009870082

    Bagged & Skidded in Warehouse
    187655

    Tokyo Electron Ltd  

    Alpha 8 S 

    List all items of this typeAtmospheric Pressure CVD Tools

    in Chemical Vapor Deposition Equipment

    1 Singapore,
    TEL Alpha 8 S, 200mm, Vertical Furnace

    TEL Alpha 8 S, 200mm, Vertical Furnace

    TEL Alpha 8 S, 200mm, Vertical Furnace, 

    LINE BUY TOOL ___  NO CONFIGURATION INFORMATION AVAILABLE


    S/N: A00009870082

    Bagged & Skidded in Warehouse

     

     

    187656

    Tokyo Electron Ltd  

    Alpha 8 S 

    List all items of this typeAtmospheric Pressure CVD Tools

    in Chemical Vapor Deposition Equipment

    1 Singapore,
    TEL Alpha 8 S, 200mm, Vertical Furnace

    TEL Alpha 8 S, 200mm, Vertical Furnace

    TEL Alpha 8 S, 200mm, Vertical Furnace, 

    LINE BUY TOOL ___  NO CONFIGURATION INFORMATION AVAILABLE


    S/N: A00009870082

    Bagged & Skidded in Warehouse
    190268

    Tokyo Electron Ltd  

    Alpha 8S 

    List all items of this typeAtmospheric Pressure CVD Tools

    in Chemical Vapor Deposition Equipment

    1 Singapore,
    TEL Alpha 8 S, 200mm, Vertical Furnace, Doping
    TEL Alpha 8 S, 200mm, Vertical Furnace, Doping

    S/N: A00009755276
    187658

    Tokyo Electron Ltd  

    Alpha 8 S 

    List all items of this typeVertical LPCVD Furnaces

    in LPCVD Furnaces

    1 Singapore,
    TEL Alpha 8 S, 200mm, Vertical Furnace, LPCVD Nitride
    TEL Alpha 8 S, 200mm, Vertical Furnace, LPCVD Nitride

    S/N: 300009675379

    In the Fab in Singapore
    189147

    Tokyo Electron Ltd  

    Alpha 8S 

    List all items of this typeAtmospheric Pressure CVD Tools

    in Chemical Vapor Deposition Equipment

    1 Singapore,
    TEL Alpha 8 S, 200mm, Vertical Furnace, SOG Cure
    TEL Alpha 8 S, 200mm, Vertical Furnace, SOG Cure

    In Warehouse, Bagged & Skidded

    S/N: A00009795484
    190746

    Tokyo Electron Ltd  

    IndyPlus 

    List all items of this typeVertical LPCVD Furnaces

    in LPCVD Furnaces

    1 N* Malta, New York
    TEL Indy +, Vertical Furnace, 300mm, ALD-HfO2
    TEL Indy +, Vertical Furnace, 300mm

    ALD-HfO2
    190747

    Tokyo Electron Ltd  

    IndyPlus 

    List all items of this typeVertical LPCVD Furnaces

    in LPCVD Furnaces

    1 N* Malta, New York
    TEL Indy +, Vertical Furnace, 300mm, ALD-HfO2

    TEL Indy +, Vertical Furnace, 300mm

    ALD-HfO2

    137543

    TEL Corp.  

    TEL Trias TI/TiN-ALD for 12" / 300 mm 

    List all items of this typeBenchtop LPVCD Furnaces

    in LPCVD Furnaces

    1 F* Regensburg, BY
    TEL Trias TI/TiN-ALD
    TEL Trias TI/TiN-ALD
    Equipment Code: CVD314-01


    TEL Trias TI/TiN-ALD
    Serial Number: C10503
    137546

    Tokyo Electron Ltd  

    TEL Trias TI/TiN-ALD for 12" / 300 mm 

    List all items of this typeCluster PECVD Tools

    in Production Tools

    1 F* Regensburg, BY
    TEL Trias TI/TiN-ALD
    TEL Trias TI/TiN-ALD
    Equipment Code: CVD314-02


    TEL Trias TI/TiN-ALD
    Serial Number: C13503
    189682

    Tokyo Electron Ltd  

    Alpha 8S 

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    in LPCVD Furnaces

    1 Singapore,
    TEL, Aplha 8 S, 200mm, Vertical Furnace, Doped Poly
    TEL, Aplha 8 S, 200mm, Vertical Furnace,  Doped Poly

    S/N: 300009645188
    178252

    Tel  

    Trias 

    List all items of this typeChemical Vapor Deposition Equipment - Other

    in Chemical Vapor Deposition Equipment

    1 Taichung, Taichung City
    TEL, CVD, 300mm
    Manufactured in 2010; Status: Crated
    178249

    Tel  

    Trias 

    List all items of this typeChemical Vapor Deposition Equipment - Other

    in Chemical Vapor Deposition Equipment

    1 Taichung, Taichung City
    TEL, Trias CVD, 300mm
    Manufactured in 2005; Status: Bagged and Skidded
    187585

    Tel  

    Trias 

    List all items of this typeChemical Vapor Deposition Equipment - Other

    in Chemical Vapor Deposition Equipment

    1 Fishkill, NY
    TEL, Trias, UVRF / High-K CVD / SPA-N / LPA modules, 300mm
    TEL, Trias, UVRF / High-K CVD / SPA-N / LPA modules

    TEL Trias Platform
    178241

    Watkins-Johnson  

    TEOS 1500 

    List all items of this typeAtmospheric Pressure CVD Tools

    in Chemical Vapor Deposition Equipment

    1 Singapore,
    WJ, CVD, TEOS 1500 200mm
    TEOS 1500  Status: In Warehouse
    178242

    Watkins-Johnson  

    TEOS 1500 

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    in Chemical Vapor Deposition Equipment

    1 F* Singapore,
    WJ, CVD, TEOS 1500 200mm
    TEOS 1500  Status: Bagged & Skidded


    *   Vendor Role: Mfr is Manufacturer; Sup is Supplier/Distributor; OEM is Original Equipment Manufacturer

    NOTE:
       photo available
       reference document attached
      F* if the item is specially featured
      N* if the item is newly added, and/or
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    Items from the following manufacturers are offered under Chemical Vapor Deposition Equipment:
    AG Associates, Applied Materials, Inc., ASM, Astex, Aviza Technology Ltd., Carbone, Cline Innovations, Kokusai, Materials Technology, Nexx Systems, Oxford Instruments, Picosun, Plasma-Therm, Silicon Valley Group, Tel, TEL Corp., Tokyo Electronics Limited, Watkins-Johnson