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 Offered (box) or Wanted (coins)  Item ID  Photo Short Description Product Type / Details # Price Notes Location
Make Model
  $  
56326
Applied Materials  

Applied Materials  

P5000 

List all items of this typeCluster PECVD Tools

in Production Tools

1   F* Scotia, NY
APPLIED MATERIALS AMAT P5000 MARK II SYSTEM
AMAT P5000 Mark II Hybrid System.
Two MxP Etch Chambers, One PECVD Nitride Chamber. Phase III handling system. 28-line onboard gas panel.
Integrated endpoint system with 2 monochromators.
Currently configured for 100mm wafers.


System is fully configurable to your specifications..
23215
Applied Materials  

Applied Materials  

P5000 MARK II 

List all items of this typeCluster PECVD Tools

in Production Tools

1   F* Scotia, NY
APPLIED MATERIALS AMAT TEOS DEPOSITION, OXID ETCH, P5000
Mark II System
TEOS Deposition, Oxide Etch
184607
Astex  

Astex  

AX5000, AX6000, AX6350 or similar 

List all items of this typeSingle Chamber PECVD Tools

in Production Tools

1   F* Leominster, MA
Astex AX5000 Microwave Plasma Diamond Growth System
  • Multiple stainless steel, Astex microwave plasma CVD chambers and plasma couplers currently available as the basis for refurbishment and reintegration.
  • Systems can be reintegrated based on customer's application needs using a combination of reliable, new and used/refurbished components.
  • This general system type enables growth of nanocrystalline. polycrystalline, or single crystal diamond (SCD) depending on configuration and operating conditions.
  • 1.5kW to 5kW microwave power input.
  • 3 stage options: Cooled, Heated, or Thermally Floating.
  • Computer controls.
189843
Astex  

Astex  

AX6500 "Clamshell" MPCVD 

List all items of this typeSingle Chamber PECVD Tools

in Production Tools

1   F*N* Leominster, Massachusetts
Astex AX6500 Diamond Growth System
  • Microwave Plasma CVD (MPCVD) "Clamshell" diamond deposition system designed & produced by Astex.
  • Capable of high rate single-crystal (SCD) diamond homoepitaxy as well as growth of polycrystalline, nanocrystalline (NCD), ultrananocrystalline diamond (UNCD).
  • System to be refurbished & updated with modernized computer controls, higher throughput water cooling subsystem, and enhanced process control/monitoring devices.
  • The AX6500 employs a unique, bottom-launched microwave plasma apparatus rated for up to 8kW of 2.45GHz microwave input.
  • Top-loaded, water-cooled aluminum chamber with water-cooled stage. Copper stage is typically shielded with special fixtures during plasma processing.
  • This system can be customized to meet customer needs and preferences.  Please contact Cline Innovations for details.
137483
Astex  

Astex  

ECR-MOCVD-PECVD 

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in Production Tools

1   F* Leominster, MA
ASTeX Large Volume Plasma Processing System (ECR-PECVD-MPCVD-MOCVD)
High density plasma system activated by 2.45GHz ECR microwave offers low temperature plasma for PECVD-MOCVD deposition, functionalization, and/or dry etching of ceramics, diamond & related carbon materials, and nanomaterials.

Computer-Controlled, low pressure, high power-density, microwave plasma system equipped with a large 28-inch dia X 51-inch long cylindrical SS chamber with full-diameter doors on each end and many ISO 150 & 250 flanges. Two Astex 2.5kW to 5KW microwave generators are used to power two permanent-magnet high-power ECR (Electron Cyclotron Resonance) sources. A planetary motion feedthrough is mounted on the top of the chamber and is equipped with RF-bias functionality (if needed) and planetary fixturing. Flexible system design is currently configured for simultaneous, high-rate, PECVD-MOCVD deposition of ceramic oxides onto many 3-D parts using gas, vapor and liquid reactants and no external heating.

Potential future uses range from large area/volume MOCVD/PECVD/deposition of ceramics/semiconductors/DLC/nanodiamond/nanomaterials, surface treatment & functionalization and/or dry etching.

This is a flexible R&D or semi-production system that was originally installed in the 1999 timeframe and used for high deposition-rate oxide PECVD/MOCVD research for less than 3-½ years. Most, if not all, of the research was focused on silicon oxide studies with rates measured in the micron/minute range using up to 10KW (2 X 5KW) of microwave power input enhanced with two ECR magnets.

187926
Cline Innovations  

Cline Innovations  

Custom CVD Diamond System 

List all items of this typeSingle Chamber PECVD Tools

in Production Tools

1   F* Leominster, MA
Custom CVD Diamond Systems

Cline Innovations is now designing and building custom microwave plasma CVD systems for technically discerning customers.  Please contact us to discuss your advanced CVD diamond process specifications.

11074
Nexx Systems  

Nexx Systems  

Cirrus 300 

List all items of this typeSingle Chamber PECVD Tools

in Production Tools

1   F* Scotia, NY
NEXX SYSTEMS ECR PECVD RIE SYSTEM
Low Temperature CVD Using ECR Technology. Formerly PlasmaQuest Astex

This system is designed for the fluorination of DLC surfaces on various substrates.
The ECR zone is produced by a Nd-Fe-B permanent magnet which produces a high magnetic field launch of the microwave energy.
High magnetic field launch produces a highly stable and efficient ECR plasma.

Nexx Systems Cirrus 300

181540
Oxford Instruments  

Oxford Instruments  

Plasmalab System 100 

List all items of this typeSingle Chamber PECVD Tools

in Production Tools

1   F* Scotia, NY
OXFORD INSTRUMENTS PLASMALAB 100 PECVD
PECVD TEOS Tool with Load Lock
147470
Plasma-Therm  

Plasma-Therm  

790 PECVD 11" 

List all items of this typeSingle Chamber PECVD Tools

in Production Tools

1   F* Scotia, NY
PLASMATHERM PECVD 790
Refurbished PECVD System with 11" Electrode
30246
Plasma-Therm  

Plasma-Therm  

VLR 700 VLR-PM1-ICRB-PM 

List all items of this typeCluster PECVD Tools

in Production Tools

1   F* Scotia, NY
PLASMATHERM VLR 700
Single Chamber PECVD. Mixed Frequency Deposition
(MFD) Both High Frequency (13.56 MHz) and Low Frequency (50-460 kHz)
RF power delivered both electrodes.
137546
Tokyo Electron Ltd  

Tokyo Electron Ltd  

TEL Trias TI/TiN-ALD for 12" / 300 mm 

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1   F* Regensburg, BY
TEL Trias TI/TiN-ALD
TEL Trias TI/TiN-ALD
Equipment Code: CVD314-02


TEL Trias TI/TiN-ALD
Serial Number: C13503


*   Vendor Role: Mfr is Manufacturer; Sup is Supplier/Distributor; OEM is Original Equipment Manufacturer

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Items from the following manufacturers are offered under Production Tools:
Applied Materials, Inc., Astex, Cline Innovations, Nexx Systems, Oxford Instruments, Plasma-Therm, Tokyo Electronics Limited