|
Item ID |
Photo |
Short Description |
Product Type / Details |
#
|
Price |
Notes |
Location |
Make |
Model |
|
|
$ |
|
|
247608
|
ASML
|
ASML |
XT1900GI |
in Wafer Steppers
ASML, XT1900GI, 300mm, S/N 4210:ASML, XT1900GI, 300mm, S/N 4210 The cymer laser is EOL.
|
1
|
|
|
|
Singapore |
|
|
112607
|
Karl Suss
|
Karl Suss |
MA 150M |
in Mask Aligners
KARL SUSS MANUAL MASK ALIGNER 150 MM:Manual Mask Aligner
The Karl Suss MA 150M Manual Mask Aligner is a mask alignment and exposure system which offers unsurpassed precision and versatility when handling wafers up to 150 mm in diameter.
|
1
|
|
|
F* |
Scotia, New York |
|
|
248319
|
Nikon
|
Nikon |
NSR-2205EX14C |
in Wafer Steppers
Nikon, NSR-2205EX14C, 200mm, S/N 7573113:Nikon, NSR-2205EX14C, 200mm, S/N 7573113
|
1
|
|
|
N* |
Singapore |
|
|
245214
|
Nikon
|
Nikon |
NSR-S208D |
in Wafer Steppers
Nikon, NSR-S208D, 300mm, S/N 8732041:Nikon, NSR-S208D, 300mm, S/N 8732041
|
1
|
|
|
|
Singapore |
|
|
247027
|
Nikon
|
Nikon |
NSR-S208D |
in Wafer Steppers
NIKON, NSR-S208D, 300mm, s/n: 8732048:NIKON, NSR-S208D, 300mm, s/n: 8732048 Lithography Step and repeat scanning system
|
1
|
|
|
|
Dresden, Saxony |
|
|
247605
|
Nikon
|
Nikon |
NSR-S208D |
in Wafer Steppers
NIKON, NSR-S208D, 300mm, s/n: S62 0290202:Lithography Step and repeat scanning system
|
1
|
|
|
|
Dresden, Saxony |
|
|
160264
|
Quintel
|
Quintel |
Q-804 |
in Mask Aligners
QUINTEL MASK ALIGNER/EXPOSURE SYSTEM:Mask Aligner/Exposure System
|
1
|
|
|
F* |
Scotia, New York |
|
|
24564
|
Quintel
|
Quintel |
UL 7000 IR |
in Mask Aligners
QUINTEL-NEUTRONIX MASK ALIGNER 200 MM:Mask Aligner with IR Backside Alignment
Quintel acquired by Neutronix
|
1
|
|
|
F* |
Scotia, New York |
|
|
248241
|
Suss Tamarack Scient
|
Suss Tamarack Scient |
TAMARACK M423 EXCIMER |
in Wafer Steppers
|
1
|
|
|
N* |
East Fishkill, New York |
|
|
131377
|
Tamarack Scientific
|
Tamarack Scientific |
Contact Mask Exposure |
in Mask Aligners
Tamarack Scientific Mask Aligner:Contact Mask Exposure System
|
1
|
|
|
F* |
Plano, TX |
|
|
|