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Single Wafer Sputtering Tools


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List all 2 product types under Single Wafer Sputtering ToolsList all 2 product types under Single Wafer Sputtering Tools


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 Offered (box) or Wanted (coins)  Item ID  Photo Short Description Product Type / Details # Price Notes Location
Make Model
  $  
178259
Cressington  

Cressington  

208HR 

List all items of this typeStandalone Sputterers

in Deposition Equipment

1   F* Singapore,
Cressington, Sputtering Systems,
Manufactured in 1999
50779
CVC  

CVC  

AST-304 

List all items of this typeStandalone Sputterers

in Deposition Equipment

1   F* Scotia, NY
CVC SPUTTERING SYSTEM, ION ETCH
Three 8" DC Magnetron/Diode electrodes, One 2.5cm Ion Source
188974
MRC  

MRC  

643P 

List all items of this typeStandalone Sputterers

in Deposition Equipment

1   F*N* Scotia, NY
KDF MRC IN-LINE SPUTTERING SYSTEM
In-Line Sputtering System -- Remanufactured by KDF MRC

Three Cathode System -- Two DC Magnetron Cathodes Installed
1973
Mill Lane Eng  

Mill Lane Eng  

4123 

List all items of this typeStandalone Sputterers

in Deposition Equipment

1   F* Scotia, New York
MILL LANE ENGINEERING REEL COATER
Reel Coater for Ribbon or Wire

The model 412-3 is a two-chamber reel to reel web coater which deposits metal or alloys on wire or ribbon substrates by sputtering from two magnetron targets arranged in a closely spaced book array. Capacity is based upon 4" ID x 12" OD x 3" wide wire/ribbon spools. Wire diameter up to 0.035" (.9mm) may be coated at speeds ranging between 2 and 40 feet per minute depending on the coating thickness desired. Constant wire speed and tension are controlled in conjunction with other parameters which enable unattended operation for extended periods. A second chamber provides plasma pre cleaning prior to entering the sputter zone through a conductance limiting tube which allows different gas compositions and pressures for cleaning and coating.
4071
MRC  

MRC  

902 

List all items of this typeStandalone Sputterers

in Deposition Equipment

1   F* Scotia, NY
MRC IN-LINE SPUTTER ETCH SYSTEM
In-Line Sputter-Etch System
44175
MRC  

MRC  

903M 

List all items of this typeStandalone Sputterers

in Deposition Equipment

1   F* Scotia, NY
MRC THREE TARGET INLINE SPUTTERING SYSTEM
Three Target Inline Sputtering System
93627
Sharon Vacuum  

Sharon Vacuum  

Sputtering System 

List all items of this typeStandalone Sputterers

in Deposition Equipment

1   F* Scotia, NY
SHARON VACUUM SPUTTERING SYSTEM
Sputtering System
32264
Varian  

Varian  

3190 

List all items of this typeStandalone Sputterers

in Deposition Equipment

1   F* Scotia, NY
VARIAN 3190 SPUTTER SYSTEM
Load locked single wafer sputter, cassette to cassette vertically mounted for sideways sputter

Currently configured for 100mm wafers
3 Target mini-quantums
RF Etch
VIPS (Vacuum Isolated Processing Station)
Residual Gas Analyzer
80699
Vergason Technology  

Vergason Technology  

Press-Side 2000 

List all items of this typeStandalone Sputterers

in Deposition Equipment

3   F* Scotia, NY
VERGASON TECHNOLOGY RAPID CYCLE METALIZING SYSTEM, 6.75" TARGET
Rapid Cycle Metalizing Systems


*   Vendor Role: Mfr is Manufacturer; Sup is Supplier/Distributor; OEM is Original Equipment Manufacturer

NOTE:
   photo available
   reference document attached
  F* if the item is specially featured
  N* if the item is newly added, and/or
  R* if the item's price is recently reduced.

Items from the following manufacturers are offered under Single Wafer Sputtering Tools:
Consolidated Vacuum Corp, Cressington, Materials Research Corp, Mill Lane Engineering, Sharon Vacuum , Varian, Vergason Technology Inc.