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Item ID |
Photo |
Short Description |
Product Type / Details |
#
|
Price |
Notes |
Location |
| Make |
Model |
| |
|
$ |
|
 |
248941
|
Nanometrics
|
Nanometrics |
8300XSE |
in Film Thickness Testers
Nanometrics 8300XSE Film Thickness Analyzer:Nanometrics 8300XSE Film Thickness Analyzer - J.A. Woollam M-44 Spectroscopic Ellipsometer
- J.A. Woollam EC-270 Ellipsometer Controller
- J.A. Woollam LPS-420 Xenon Light Source
- Manual Loading of up to 300mm Wafers
- Yaskawa ERCR-NS01-B004 Motion Controller
- Please Inquire for Additional Details
|
1
|
|
|
 |
Austin, Texas |
|
 |
261179
|
Nanometrics
|
Nanometrics |
ECV Pro UV |
in Metrology Equipment
Nanometrics ECV Pro UV Electrochemical CV Profiler:Nanometrics ECVPro Carrier Concentration Profiler - For Si, SiC, II-VI, III-V & III-Nitrides
- Hamamatsu LC8 UV Light Source
- ECVision In-Situ Camera System
- Dual Frequency Measurement
- Carrier Frequency: 0.3kHz to 50kHz
- Depth Range: 0.05μm to 50μm
- Depth Resolution: 1nm
- Dell PC, Windows 8 OS, ECV Pro SW Version 2.4.6.0
Installation & Training Available
|
1
|
|
110,029.48 |
 |
Plano, Texas |
|
 |
3863
|
Nanometrics
|
Nanometrics |
NANOLINE III |
in Critical Dimension Measurement Equipment
NANOMETRICS CRITICAL DIMENSION COMPUTER:Critical Dimension Computer
Large memory digital computer calculates line widths and provides statistics on in process wafer and photomasks.
|
1
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|
|
F* |
Scotia, New York |
|
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