Other Information | The AX7610 is a microwave plasma source for downstream chemical etch applications, such as photoresist stripping and hard mask removal. With replaceable quartz or sapphire tubes, the AX7610 downstream source offers flexibility of configuration to meet the most demanding application process parameters. The sapphire tube version is compatible with much more severe CF4 and NF3 chemistries for isotopic etch and other applications.
Sapphire Plasma Source Tube P/N FI20101 Applied part number: 3750-0112 Specifications:
2450 MHz Max power output: 3 kW Inert gas fitting: 1/4" VCR Output flange: KF 40 Operating pressure: 2 to 8 Torr Elect requirements: 24VDC 1 Amp Process gas compatibility: O2, N2, H2O, Ar, NF3, CF4, F6, and other Florine based gases |