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Programmable Robotic Photoresist Develop Tracks
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Manufacturer
Model
Wafer Size Range Minimum
Wafer Size Range Maximum
Wafer Size Range Set Size
Photoresist Type
Number of Robots
Number of Cassette Elevators
Number of Photoresist Develop Stations
Number of Developer Dispensers
Number of Developer Rinse Dispensers
Wafer Backside Rinse
Bowl Rinse
Number of Hot Plates
Number of Chill Plates
Stepper Interface
Interface Type
Mini-Environment
Controller Type
Software Revision Level
Refurbished
Accessories
Other Information
Extended Description
Year of Manufacture
Condition
Power Requirements Voltage
Power Requirements Amps
Power Requirements Amps 2
Power Requirements Frequency
Power Requirements Phase
CE Marked
External Cooling
Cooling Water Reqd Minimum Flow
Cooling Water Reqd Minimum Temperature
Cooling Water Reqd Maximum Temperature
Operating Air Pressure
Air Consumption
Vacuum Required
Exterior Dimensions Width
Exterior Dimensions Depth
Exterior Dimensions Height
Weight