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Item ID  Photo Short Description Product Type / Details # Price Notes Location Make Model   $   256502 LAM Research Corp.   LAM Research Corp.   Allian  Cluster Plasma Tools - Oxide in Cluster Plasma Tools 1   Villach, Carinthia 252024 Applied Materials   Applied Materials   200mm Centura II  Cluster Plasma Tools - Other in Cluster Plasma Tools AMAT 200mm Centura II DXZx: Centura MF II Software: Vita Controller Indexer: Narrow Body / Tilt out mit Dummy Wafer Storage Robot: HP+ Chamber: A -> DPS+ B -> DPS+ C -> IPS D -> ASP+ E -> Single Cooldown F -> Orienter 1   Regensburg, Bavaria 255827 LAM Research Corp.   LAM Research Corp.   2300 Kiyo  Cluster Plasma Tools - Oxide in Cluster Plasma Tools Lam Kiyo Chamber L2301-B: Semiconductor ETC Chamber with RF Cart Incl. Gasbox and Rocker Valve in production until January 2023 1   Villach, Carinthia 259300 LAM Research Corp.   LAM Research Corp.   Rainbow 4520 XL  Cluster Plasma Tools - Oxide in Cluster Plasma Tools LAM Rainbow 4520 XL: - without UI Computer, Chiller and Pump - Generatorrack with 2 Generatoren 2MHz und 27MHz (135kg) - no ISO Chamber 1   Regensburg, Bavaria 259305 LAM Research Corp.   LAM Research Corp.   TCP 9600  Cluster Plasma Tools - Metal in Cluster Plasma Tools LAM Research TCP 9600: - without UI Computer - Envision, ESC, Fixed Gap 1   Regensburg, Bavaria 119294 Trion Technology   Trion Technology   Oracle  Cluster Plasma Tools - Oxide in Cluster Plasma Tools TRION TECHNOLOGY DIELECTRIC CLUSTER TOOL: Dielectric Cluster Tool Trion Technology Oracle 1   F* Scotia, New York 126704 Ulvac   Ulvac   NE 7800 Ferroelectric Etcher  Cluster Plasma Tools - Metal in Cluster Plasma Tools ULVAC FERROELECTRIC ETCHER: Like New Condition System installed in October of 2007, decommission in Feburary of 2008. Used in a R&D application The Ulvac NE 7800 is a high-temperature, high-density plasma etching system utilizing an Inductive Super Magnetron source (ICP with magnetic field). The NE 7800 is a dual load locked, cassette to cassette system designed for both R&D and production applications. Outstanding metal etching process stability for Pt/Ir/magnetic films and difficult to etch materials such as FeRAM and MRAM devices.   1   F* Scotia, New York

*   Vendor Role: Mfr is Manufacturer; Sup is Supplier/Distributor; OEM is Original Equipment Manufacturer

NOTE:
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   reference document attached
  F* if the item is specially featured
  N* if the item is newly added, and/or
  R* if the item's price is recently reduced.

Items from the following manufacturers are offered under Cluster Plasma Tools: Applied Materials, Inc., LAM Research Corp., Trion Technology, Ulvac