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Item ID  Photo Short Description Product Type / Details # Price Notes Location Make Model   $   255827 LAM Research Corp.   LAM Research Corp.   2300 Kiyo  Cluster Plasma Tools - Oxide in Cluster Plasma Tools Lam Kiyo Chamber L2301-B: Semiconductor ETC Chamber with RF Cart Incl. Gasbox and Rocker Valve in production until January 2023 1   Villach, Carinthia 262166 LAM Research Corp.   LAM Research Corp.   2300  Cluster Plasma Tools - Other in Cluster Plasma Tools LAM RESEARCH 2300 Dielectric/Metal Etch Tool : LAM RESEARCH 2300 Dielectric/Metal Etch Tool 2300 Platform V2 Etch Transfer Module 3ea 200mm Open Cassette Loadports Front & Side User Interface Monitors CDM Wafer Handling Robot 2300 Exelan Flex45 Dielectric Etch Process Module OES 2 End Point Detection Low Temperature ESC Boce 2700 LPM Turbo Pump 16 Regulated Gas Channels Versys HP Metal Etch Process Module OES 2 End Point Detection Boce 2200 LPM Turbo Pump 16 Regulated Gas Channels Microwave Stripper Process Module On Board Gas System 3 Regulated Gas Channels Manufactured in 2023 Unused Since Installation/Qualification All Pumps, Generators & Other Subsystems Included PLEASE CONTACT US FOR FURTHER INFORMATION 1   N* Tokyo, Tokyo 259305 LAM Research Corp.   LAM Research Corp.   TCP 9600  Cluster Plasma Tools - Metal in Cluster Plasma Tools LAM Research TCP 9600: - without UI Computer - Envision, ESC, Fixed Gap 1   Regensburg, Bavaria 119294 Trion Technology   Trion Technology   Oracle  Cluster Plasma Tools - Oxide in Cluster Plasma Tools TRION TECHNOLOGY DIELECTRIC CLUSTER TOOL: Dielectric Cluster Tool Trion Technology Oracle 1   F* Scotia, New York 126704 Ulvac   Ulvac   NE 7800 Ferroelectric Etcher  Cluster Plasma Tools - Metal in Cluster Plasma Tools ULVAC FERROELECTRIC ETCHER: Like New Condition System installed in October of 2007, decommission in Feburary of 2008. Used in a R&D application The Ulvac NE 7800 is a high-temperature, high-density plasma etching system utilizing an Inductive Super Magnetron source (ICP with magnetic field). The NE 7800 is a dual load locked, cassette to cassette system designed for both R&D and production applications. Outstanding metal etching process stability for Pt/Ir/magnetic films and difficult to etch materials such as FeRAM and MRAM devices.   1   F* Scotia, New York

*   Vendor Role: Mfr is Manufacturer; Sup is Supplier/Distributor; OEM is Original Equipment Manufacturer

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  F* if the item is specially featured
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Items from the following manufacturers are offered under Cluster Plasma Tools: LAM Research Corp., Trion Technology, Ulvac