EVG Lithoscale - Maskless Exposure System:Up to 300mm, Low-Volume Manufacturing, automated substrate handling
Brandnew and unsed System available for an attractive price!
Out of package Hyperion
Technical configuration:
• For maskless exposure of wafer sizes up to 300 mm
• High precision stage including contactless wedge error compensation
• Self calibration via integrated sensors
• Extensibility up to two (2) exposure heads in total for highest throughput
• Separate control unit
• EVG CIM Framework software
• Self diagnostics during machine start up, automatic initialization of all motors, position end switches, sensors and pneumatic
• Inspection available on request
• PC controlled operating environment
• Solid state drive and hard drive for high availability and reliability
• Supported layout format: GDSII