 |
Item ID |
Photo |
Short Description |
Product Type / Details |
#
|
Price |
Notes |
Location |
| Make |
Model |
| |
|
$ |
|
 |
258113
|
Tel
|
Tel |
ACT8-D |
in Lithography Equipment
TEL ACT8-D -Track :ACT DB System, AC Power Box, T/C Unit 1+2, T/H Controller ESA 1+2, Chemical Cabinet 1, 2, 3
|
1
|
|
|
 |
Dresden, Sachsen |
|
|
259649
|
Canon
|
Canon |
5500iz |
in Lithography Equipment
CANON 5500iZ - Stepper:'- 12" Standard Wafer Chuck and 12" wafer handling system
- SMIF type reticle loading ports and reticle changer unit
- Pellicle Particle checker installed - Hg-lamp will be rmoved prior shipping
- Coolant will be removed prior shipping
- all batteries will be removed prior shipping
|
1
|
|
|
N* |
Dresden, Sachsen |
|
|
250700
|
Canon
|
Canon |
3000i4 |
in Wafer Steppers
Canon FPA 3000 i4 Stepper :Only for sale for an competetive price! Configuration: left inline system;
8" wafer chuck;
Nikon Type Reticle changer; 6" Reticle major hardware and software changes in control system: EWS type changed to HP B180, O/S changed to HP-UX 10.20, original X-Terminal replaced by a Windows PC + 17" touchscreen TFT Hg lamp will be removed prior shipping
Coolant will be removed prior shipping
Batteries will be removed prior shipping no UPS installed. No printer installed. No MO-drive EOL: optical parts Last Time in production: 05/24
|
1
|
|
|
|
Dresden, Saxony |
|
|
250701
|
Canon
|
Canon |
3000i4 |
in Wafer Steppers
Canon FPA 3000 i4 Stepper :Configuration: left inline system;
8" wafer chuck;
Nikon Type Reticle changer; 6" Reticle major hardware and software changes in control system: EWS type changed to HP B180, O/S changed to HP-UX 10.20, original X-Terminal replaced by a Windows PC + 17" touchscreen TFT Hg lamp will be removed prior shipping
Coolant will be removed prior shipping
Batteries will be removed prior shipping no UPS installed. No printer installed. No MO-drive EOL: optical parts Last Time in production: 05/24
|
1
|
|
|
|
Dresden, Saxony |
|
|
250488
|
Tel
|
Tel |
MK7-S |
in Lithography Equipment
TEL MK7-S Coater_Developer:missing parts: 2 resist pumps, 1Developer Line Add. Info: TYP A1
M/C Typ FC-9801F#1
SD/HD Typ Commandpost
System Vers. MK8G2.38
Alarm File ALM00166.OEN
Sp. Al.File AL00TT.OEN
GEM 1.72
Lines 1(3)
Pumps 1xmini
EBR programable
T/H-Controller Semifab CD200
Backrinse yes
Lines 1 x H-Nozzle
Rinse yes
Backrinse yes Last Time in production 1/1/24
|
1
|
|
|
|
Dresden, Saxony |
|
|
250489
|
Tel
|
Tel |
MK7-S |
in Lithography Equipment
TEL MK7-S Coater_Developer:missing parts: 2 resist pumps, 1Developer Line Add. Info: TYP A
M/C Typ FC-9801F#1
SD/HD Typ Commandpost
System Vers. MK8G2.38
Alarm File ALM00166.OEN
Sp. Al.File AL00TT.OEN
GEM 1.72
Lines 1(3)
Pumps 1xmini
EBR programable
T/H-Controller Semifab CD200
Backrinse yes
Lines 1 x H-Nozzle
Rinse yes
Backrinse yes Last Time in production 1/1/24
|
1
|
|
|
|
Dresden, Saxony |
|
|
250490
|
Tel
|
Tel |
MK7-S |
in Lithography Equipment
TEL MK7-S Coater_Developer:missing parts: 2 resist pumps, 1Developer Line Add. Info: TYP A
M/C Typ FC-9801F#1
SD/HD Typ Commandpost
System Vers. MK8G2.38
Alarm File ALM00166.OEN
Sp. Al.File AL00TT.OEN
GEM 1.72
Lines 1(3)
Pumps 1xmini
EBR programable
T/H-Controller Semifab CD200
Backrinse yes
Lines 1 x H-Nozzle
Rinse yes
Backrinse yes
|
1
|
|
|
|
Dresden, Saxony |
|
|
250491
|
Tel
|
Tel |
MK7-S |
in Lithography Equipment
TEL MK7-S Coater_Developer:missing parts: 2 resist pumps, 1Developer Line Add. Info: TYP A
M/C Typ FC-9801F#2
SD/HD Typ Commandpost
System Vers. MK8G2.38
Alarm File ALM00166.OEN
Sp. Al.File AL00TT.OEN
GEM 1.72
Lines 1(3)
Pumps 1xmini
EBR programable
T/H-Controller Shinwa CP-I
Backrinse yes
Lines 1 x H-Nozzle
Rinse yes
Backrinse yes Last time in production: 01.01.24
|
1
|
|
|
|
Dresden, Saxony |
|
|
131377
|
Tamarack Scientific
|
Tamarack Scientific |
Contact Mask Exposure |
in Mask Aligners
Tamarack Scientific Mask Aligner:Contact Mask Exposure System
|
1
|
|
|
F* |
Plano, TX |
|
|
9971
|
Headway
|
Headway |
P8X20-30 |
in Photoresist Coaters
Headway Research P8X20-30:AC Spindle Motor for AC-101 Photoresist Spinner, New
|
1
|
|
|
|
Plano, TX |
|
|
259661
|
Tel
|
Tel |
ACT12 |
in Lithography Equipment
TEL ACT12 Track 12 Zoll:two process blocks ACT 12 PIQ with 16 HCH Plates, 4 PCT´s 2 DEV Units, 1 WEE last time in production: 07.08.2024
|
1
|
|
|
N* |
Regensburg, Bavaria |
|
|
160264
|
Quintel
|
Quintel |
Q-804 |
in Mask Aligners
QUINTEL MASK ALIGNER/EXPOSURE SYSTEM:Mask Aligner/Exposure System
|
1
|
|
|
|
Scotia, New York |
|
|
13097
|
AB-M Inc.
|
AB-M Inc. |
IR Wafer Aligner |
in Lithography Equipment
AB-M INC. IR WAFER ALIGNER STATION:IR Wafer Aligner Station
|
1
|
|
|
|
Scotia, New York |
|
|
4005
|
Solitec
|
Solitec |
820-CB |
in Photoresist Develop Track Systems
SOLITEC AUTOMATIC TWO-STATION PHOTORESIST COAT & BAKE:Automatic Two-station
Photoresist Coat & Bake
Designed to coat and soft
bake semiconductor wafers.
|
1
|
|
|
F* |
Scotia, New York |
|
|
4007
|
Solitec
|
Solitec |
820-PTDB |
in Photoresist Develop Track Systems
SOLITEC TEMPERATURE CONTROLLED POSITIVE DEVELOPER:Temperature Controlled Positive
Developer with Hot Plate Bake
Designed to develop and hard
bake semiconductor wafers.
|
1
|
|
|
F* |
Scotia, New York |
|
|
154092
|
Silicon Valley Group
|
Silicon Valley Group |
8136 |
in Photoresist Tools
SVG SILICON VALLEY GROUP SINGLE TRACK HOT PLATE OVEN:Single Track Hot Plate Oven
Silicon Valley Group 8136
|
1
|
|
|
|
Scotia, New York |
|
|
5026
|
Solitec
|
Solitec |
5110SJC |
in Photoresist Developers
SOLITEC SCRUBBER/HI PRESSURE SPRAY: Scrubber/Hi Pressure Spray
|
1
|
|
|
F* |
Scotia, New York |
|
|
44184
|
Suss MicroTec
|
Suss MicroTec |
Respect 600 |
in Photoresist Developers
BLE RESPECT AUTOMATIC PHOTORESIST DEVELOPER:
System is designed exclusively to develop and bake substrates
using spinning and heating techniques
BLE was acquired by Suss Microtec
|
1
|
|
|
F* |
Scotia, New York |
|
|
24564
|
Quintel
|
Quintel |
UL 7000 IR |
in Mask Aligners
QUINTEL-NEUTRONIX MASK ALIGNER 200 MM:Mask Aligner with IR Backside Alignment
Quintel acquired by Neutronix
|
1
|
|
|
F* |
Scotia, New York |
|
|
112607
|
Karl Suss
|
Karl Suss |
MA 150M |
in Mask Aligners
KARL SUSS MANUAL MASK ALIGNER 150 MM:Manual Mask Aligner
The Karl Suss MA 150M Manual Mask Aligner is a mask alignment and exposure system which offers
unsurpassed precision and versatility when handling wafers up to 150 mm in diameter.
|
1
|
|
|
F* |
Scotia, New York |
|
|
41529
|
Headway
|
Headway |
CB15 |
in Photoresist Coaters
HEADWAY RESEARCH MANUAL PHOTORESIST SPIN COATER:Manual Photoresist Spin Coater
|
1
|
|
|
F* |
Scotia, New York |
|
|
44185
|
Suss MicroTec
|
Suss MicroTec |
RESPECT 600 |
in Photoresist Coaters
BLE RESPECT AUTOMATIC PHOTORESIST COATER:Automatic Photoresist Coater
System is designed exclusively to coat and bake substrates
using spinning and heating techniques. BLE was acquired by Suss Microtec
|
1
|
|
|
F* |
Scotia, New York |
|
|
89964
|
AIO Microservice
|
AIO Microservice |
8826 |
in Photoresist Coater Tracks
AIO MICROSERVICE DUAL TRACK COAT SYSTEM:Dual Track Coat System
|
1
|
|
|
F* |
Scotia, New York |
|
|
42108
|
Suss MicroTec
|
Suss MicroTec |
FALCON - ACS 200 |
in Photoresist Coater/Developers
SUSS MICROTEC FALCON ACS 200:Fully Automated High Throughput Coating, Developing Cluster System
System configured for Anti-reflective coating (A.R.C) and Ebeam Resist.
|
1
|
|
|
F* |
Scotia, New York |
|
|
206539
|
Specialty Coating
|
Specialty Coating |
G3-8 |
in Photoresist Coaters
SPECIALTY COATING SYSTEMS SPIN COATER 8":Spin Coater
|
1
|
|
4,501.21 |
|
Scotia, New York |
|
|
206300
|
Specialty Coating
|
Specialty Coating |
P3201 |
in Photoresist Coaters
SPECIALTY COATING SYSTEMS DIP COATER:Dip Coater
|
1
|
|
7,752.08 |
|
Scotia, New York |
|
|
77000
|
Brewer Science
|
Brewer Science |
CEE 4000 |
in Photoresist Coater Tracks
BREWER SCIENCE INC. PROGRAMMABLE AUTOMATED COAT/BAKE TRACK SYSTEM:Programmable Automated Coat/Bake Track System
|
2
|
|
|
F* |
Scotia, NY |
|
How to post on WWX
How to post your own listings
View prices in $ or ... 
ALL CATEGORIES 
reference document attached
Group Offers into sub-categories 
