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Item ID  Photo Short Description Product Type / Details # Price Notes Location Make Model   $   184607 Astex   Astex   AX5000, AX6000, AX6350 or similar  Single Chamber PECVD Tools in Production Tools Astex AX5000 Microwave Plasma Diamond Growth System: Cline Innovations has all components necessary to refurbish and reintegrate a 5kW Astex MPCVD system for R&D or limited production. System can be rebuilt based on customer's application needs using a combination of reliable, new and used/refurbished components. Alternatively, a kit of core components can be offered for skilled users interested in building their own system. This general system type enables growth of nanocrystalline. polycrystalline, or single crystal diamond (SCD) depending on configuration and operating conditions. 1.5kW to 5kW microwave power input. 3 stage options: Cooled, Heated, or Thermally Floating. Integration with computer controls is strongly recommended. Chamber designs vary by vintage, but can be confirmed at the time of quotation. Please note that the chamber shown in the attached image is a new chamber.  The most typical configuration involves the use of a used, professionally-refurbished double-jacked, water cooled chamber of the same general AX5000 design. 1   F* Leominster, Massachusetts 189843 Astex   Astex   AX6500 "Clamshell" MPCVD  Single Chamber PECVD Tools in Production Tools Astex AX6500 Bottom-launch Diamond Growth System: This in-stock equipment is offered for domestic sale within the USA only.  Microwave Plasma CVD (MPCVD) "Clamshell" diamond deposition system designed & produced by Astex. Capable of high rate single-crystal diamond (SCD) homoepitaxy as well as growth of polycrystalline, nanocrystalline (NCD or UNCD). System is in the process of being refurbished with a majority of refurbishment already completed with the focus on improved purity, process control, and system safety: Chamber cleaning, Computer control updates, Higher throughput water cooling subsystem, Replacement of selected o-ring components with metal seals, and Enhanced process control/monitoring devices. The AX6500 employs a unique, bottom-launched microwave plasma apparatus rated for up to 8kW of 2.45GHz microwave input. Top-loaded, water-cooled aluminum chamber with water-cooled stage. Copper stage is typically shielded with special fixtures during plasma processing. Photo Note: System photo shown include a similar quality, similar vintage system sold in the past.  Actual photos or inspection available to qualified customers only. 1   Leominster, Massachusetts 137483 Astex   Astex   ECR-MOCVD-PECVD  Single Chamber PECVD Tools in Production Tools ASTeX Large Volume Plasma Processing System (ECR-PECVD-MPCVD-MOCVD): High density plasma system activated by ECR-enhanced, 2.45GHz microwave input offers PECVD-MOCVD deposition, functionalization, and/or dry etching of ceramics, carbon-based materials, and nanomaterials at relatively low substrate temperatures. Computer-Controlled, low pressure, high power-density, microwave plasma system equipped with a large 28-inch dia X 51-inch long cylindrical SS chamber with full-diameter doors on each end and many ISO 150 & 250 flanges. Two Astex 2.5kW to 5KW microwave generators are used to power two permanent-magnet high-power ECR (Electron Cyclotron Resonance) sources. A planetary motion feedthrough is mounted on the top of the chamber and is equipped with RF-bias functionality (if needed) and planetary fixturing. Flexible system design is currently configured for simultaneous, high-rate, PECVD-MOCVD deposition of ceramic oxides onto many 3-D parts using gas, vapor and liquid reactants and no external heating. Potential future uses range from large area (or large volume) PECVD (or plasma MOCVD) deposition of ceramics, semiconductors, DLC, nanodiamond, nanomaterials as well as surface treatment, functionalization and/or dry plasma etching. This is a flexible R&D or semi-production system that was originally installed in the 1999 timeframe and used for high deposition-rate oxide PECVD/MOCVD research for less than 3-½ years. Most, if not all, of the research was focused on silicon oxide studies with rates measured in the micron/minute range using up to 10KW (2 X 5KW) of microwave power input enhanced with two ECR magnets. 1   Leominster, Massachusetts 11074 Nexx Systems   Nexx Systems   Cirrus 300  Single Chamber PECVD Tools in Production Tools NEXX SYSTEMS ECR PECVD RIE SYSTEM: Low Temperature CVD Using ECR Technology. Formerly PlasmaQuest Astex This system is designed for the fluorination of DLC surfaces on various substrates. The ECR zone is produced by a Nd-Fe-B permanent magnet which produces a high magnetic field launch of the microwave energy. High magnetic field launch produces a highly stable and efficient ECR plasma. Nexx Systems Cirrus 300 1   F* Scotia, New York 181540 Oxford Instruments   Oxford Instruments   Plasmalab System 100  Single Chamber PECVD Tools in Production Tools OXFORD INSTRUMENTS PLASMALAB 100 PECVD: PECVD TEOS Tool with Load Lock NB: System needs a computer-software upgrade.  Selling this system AS IS, WHERE IS. 1   F* Scotia, New York 242656 Applied Materials   Applied Materials   P5000  Cluster PECVD Tools in Production Tools P5000: CHAMBER A  Universal CVD Teos CHAMBER B  Universal CVD Teos CHAMBER C Mark2 Etch CHAMBER D Mark2 Etch The Tool is sold with 4 chambers and was productiv until August 2023 1   Villach, Carinthia 242682 Applied Materials   Applied Materials   P5000  Cluster PECVD Tools in Production Tools P5000: CHAMBER A  x   Universal CVD Teos CHAMBER B  x   Universal CVD Teos CHAMBER D x   Universal CVD Teos Tool is sold with three chambers and was used in cleanroom until August 2023 1   Villach, Carinthia 147470 Plasma-Therm   Plasma-Therm   790 PECVD 11"  Single Chamber PECVD Tools in Production Tools PLASMATHERM PECVD 790: Refurbished PECVD System with 11" Electrode 1   F* Scotia, NY 30246 Plasma-Therm   Plasma-Therm   VLR 700 VLR-PM1-ICRB-PM  Cluster PECVD Tools in Production Tools PLASMATHERM VLR 700: Single Chamber PECVD. Mixed Frequency Deposition (MFD) Both High Frequency (13.56 MHz) and Low Frequency (50-460 kHz) RF power delivered both electrodes. 1   F* Scotia, New York

*   Vendor Role: Mfr is Manufacturer; Sup is Supplier/Distributor; OEM is Original Equipment Manufacturer

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Items from the following manufacturers are offered under PECVD Tools: Applied Materials, Inc., Astex, Nexx Systems, Oxford Instruments, Plasma-Therm