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List all 12 product types under Parallel Plasma ToolsList all 12 product types under Parallel Plasma Tools


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 Offered (box) or Wanted (coins)  Item ID  Photo Short Description Product Type / Details # Price Notes Location
Make Model
  $  
87948
Applied Materials  

Applied Materials  

8300 

List all items of this typeOxide Etchers

in Single Chamber Plasma Tools

APPLIED MATERIALS CONTROLLER:

Controller

1   Scotia, New York
87949
Applied Materials  

Applied Materials  

8300 

List all items of this typeOxide Etchers

in Single Chamber Plasma Tools

APPLIED MATERIALS SYSTEM ELECTRONICS RACK:

System Electronics Rack

1   Scotia, New York
34890
LAM Research Co  

LAM Research Co  

490 AUTO ETCH 

List all items of this typePoly/Nitride Etchers

in Single Chamber Plasma Tools

LAM RESEARCH SIX INCH NITRIDE ETCHER:

Six Inch Nitride Etcher

Automated Cassette to Cassette single wafer etching.

1   F* Scotia, New York
225948
Plasma-Therm  

Plasma-Therm  

790 

List all items of this typeEtchers - Other

in Single Chamber Plasma Tools

Plasma-Therm 790 Reactive Ion Etcher - Remaufactured with ECT Upgrade:

PLASMA-THERM 790 Reactive Ion Etcher; Serial Number PTI-78272F

  • Manually Loaded Process Chamber with 8” (dia.) Cathode
  • Gas Distribution Panel with 4ea Gas Channels
    • MKS 1479 Metal Sealed Mass Flow Controllers
    • 4ea Additional Gas Channels Available
  • RFPP RF5S RF Generator: 500W @ 13.56MHz
  • RFPP AMN-5 Auto Matching Network
  • RFPP AMNPS-2A Auto Matching Network Controller
  • Leybold TMP 361 Turbomolecular Pump
  • Leybold NT 150/360 Turbomolecular Pump Controller
  • EquipmentWorks 2.6 Application SW
  • Industrial PC Running UBUNTU LINUX OS, Intel I7 CPU at 3.4 GHz,16Gb RAM & 500GB SSD
  • All Analog & Digital I/O Modules Controlled by BECKHOFF Ethernet I/O Via Modbus TCP/IP Communications Protocol.
  • All I/O Modules Available from BECKHOFF Automation and are Plug & Play Compatible
  • All Pneumatic Valves Controlled by SMC Modules Via Modbus TCP/IP Communications Protocol
  • All SMC Pneumatic Valves Available from SMC USA
  • Standard 21” Flat Panel Monitor, Keyboard & Mouse
  • Edwards QDP40 Dry Roughing Pump
  • NESLAB HX-75 Chiller
  • Electrical Disconnect Box - 208V, 60Hz, 3 Ph
  • System Fully Refurbished & Ready for Demonstration
  • Guaranteed to Meet or Exceed OEM Specifications
  • Price……$ 80,000.00 USD
1 80,021.44 Plano, Texas
3011
Plasma-Therm  

Plasma-Therm  

Wafer Batch 740/740 

List all items of this typeMetal Etchers

in Single Chamber Plasma Tools

PLASMA-THERM DUAL PLASMA ETCH AND REACTIVE ION ETCH SYSTEM 200MM:

Dual Plasma Etch and Reactive
Ion Etch Processing Systems


System consists of a process chamber, upper electrode (with gas feed), and substrate electrode.

 

1   Scotia, New York
4054
Plasma-Therm  

Plasma-Therm  

73/74 

List all items of this typeMetal Etchers

in Single Chamber Plasma Tools

PLASMA-THERM PECVD AND DUAL PLASMA ETCH/REACTIVE ION ETCH SYSTEM:

Combination PECVD and Dual
Plasma Etch/Reactive Ion Etch
Processing Systems

1   Scotia, New York
50854
Plasma-Therm  

Plasma-Therm  

VII 734 

List all items of this typeMetal Etchers

in Single Chamber Plasma Tools

PLASMA-THERM PLASMA DEPOSITION SYSTEM/RIE:

Combination Plasma Deposition System/RIE

1   F* Scotia, New York
11919
Plasma-Therm  

Plasma-Therm  

VII 734MF 

List all items of this typeMetal Etchers

in Single Chamber Plasma Tools

PLASMA-THERM REACTIVE ION ETCH/PLASMA ETCH SYSTEM:

Plasmatherm RIE/Plasma Etch System

1   F* Scotia, New York
165893
PlasmaQuest  

PlasmaQuest  

6" Load-Lock 

List all items of this typeSilicon Etchers

in Single Chamber Plasma Tools

PlasmaQuest Microwave-ECR Plasma etch system:
  • PlasmaQuest high density plasma etch tool equipped with 6-inch load lock.
  • Unique combo of permanent magnet and electromagnets for ECR (Electron Cyclotron Resonance) ECR-enhancement of microwave plasma.
  • ECR operation in mTorr pressure range yields large area plasma processing capability for planar and low profile parts.
  • Stage height adjustment range relative to core plasma activation volume enables high levels of ECR process enhancement (species activation).
  • Originally equipped with 1000W Astex microwave delivery system (AX2110 or equivalent), but higher input power may be viable.
  • System can be offered "as is" to experienced buyers.
  • Full refurbishment for etch and/or PECVD processing can be considered.
  • Configured with 2 modules including power & controls rack and vacuum module.
  • Computer controller may function, but upgrade is recommended and should be possible.
1   Leominster, Massachusetts
206582
Plasma-Therm  

Plasma-Therm  

BT 6" RIE MF 

List all items of this typeMetal Etchers

in Single Chamber Plasma Tools

PLASMATHERM BatchTop VII REACTIVE ION ETCH SYSTEM 6":

Reactive Ion Etch System

BatchTop VII

1   Scotia, New York
45428
Plasma-Therm  

Plasma-Therm  

790 ICP 

List all items of this typePoly/Nitride Etchers

in Single Chamber Plasma Tools

PLASMATHERM ICP PLASMA ETCHER:

Inductively Coupled Plasma Etcher with 9.5 Inch Electrode

1   F* Scotia, New York
201152
Plasma-Therm  

Plasma-Therm  

790 RIE PECVD 11" 

List all items of this typeEtchers - Other

in Single Chamber Plasma Tools

PLASMATHERM RIE PECVD MOUNTED IN GLOVEBOX:

Reactive Ion Etch / PECVD system mounted in glovebox with an intregrated air purfier O2 and H20 sensors on board.

Both top and bottom electrodes can be powered sequentially.


1   Scotia, New York
142821
Plasma-Therm  

Plasma-Therm  

Unaxis 790 

List all items of this typeEtchers - Other

in Single Chamber Plasma Tools

PLASMATHERM UNAXIS DUAL CHAMBER SHUTTLE LOAD LOCK SYSTEM:

Shuttle Load Lock System

1   Scotia, New York
147500
Surface Tech Sys  

Surface Tech Sys  

MXP Multiplex ICP HR 

List all items of this typeEtchers - Other

in Single Chamber Plasma Tools

SURFACE TECHNOLOGY SYSTEMS MXP ICP HR:

Chlorine Etcher - Year 2003

1   Scotia, New York
102178
Surface Tech Sys  

Surface Tech Sys  

MXP Multiplex ICP ASE HR 

List all items of this typeSilicon Etchers

in Single Chamber Plasma Tools

SURFACE TECHNOLOGY SYSTEMS STS SILICON ICP ETCHER:

Silicon Etcher - Year 2003

1   Scotia, New York
184779
Technics  

Technics  

Micro Stripper -- Series 200 

List all items of this typeMetal Etchers

in Single Chamber Plasma Tools

TECHNICS PLASMA ETCHER 200 WATT 13.65 MHz:

Technics Micro Stripper Series 200 Plasma System

1   F* Scotia, New York
119294
Trion Technology  

Trion Technology  

Oracle 

List all items of this typeCluster Plasma Tools - Oxide

in Cluster Plasma Tools

TRION TECHNOLOGY DIELECTRIC CLUSTER TOOL:

Dielectric Cluster Tool


Trion Technology Oracle

1   F* Scotia, New York
126704
Ulvac  

Ulvac  

NE 7800 Ferroelectric Etcher 

List all items of this typeCluster Plasma Tools - Metal

in Cluster Plasma Tools

ULVAC FERROELECTRIC ETCHER:

Like New Condition
System installed in October of 2007, decommission in Feburary of 2008. Used in a R&D application


The Ulvac NE 7800 is a high-temperature, high-density plasma etching system utilizing an Inductive Super Magnetron source (ICP with magnetic field).
The NE 7800 is a dual load locked, cassette to cassette system designed for both R&D and production applications.
Outstanding metal etching process stability for Pt/Ir/magnetic films and difficult to etch materials such as FeRAM and MRAM devices.

 

1   F* Scotia, New York


*   Vendor Role: Mfr is Manufacturer; Sup is Supplier/Distributor; OEM is Original Equipment Manufacturer

NOTE:
   photo available
   reference document attached
  F* if the item is specially featured
  N* if the item is newly added, and/or
  R* if the item's price is recently reduced.

Items from the following manufacturers are offered under Parallel Plasma Tools:
Applied Materials, Inc., LAM Research Corp., Plasma-Therm, PlasmaQuest, Surface Technology Systems, Technics, Trion Technology, Ulvac