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	View All Offers Under Plasma Etch Equipment » Switch Major Category		Click an item's ID# below for its full specifications and source, or: Group Offers into sub-categories under Plasma Etch Equipment List all 13 product types under Plasma Etch Equipment

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Item ID  Photo Short Description Product Type / Details # Price Notes Location Make Model   $   256502 LAM Research Corp.   LAM Research Corp.   Allian  Cluster Plasma Tools - Oxide in Cluster Plasma Tools 1   N* Villach, Carinthia 252024 Applied Materials   Applied Materials   200mm Centura II  Cluster Plasma Tools - Other in Cluster Plasma Tools AMAT 200mm Centura II DXZx: Centura MF II Software: Vita Controller Indexer: Narrow Body / Tilt out mit Dummy Wafer Storage Robot: HP+ Chamber: A -> DPS+ B -> DPS+ C -> IPS D -> ASP+ E -> Single Cooldown F -> Orienter 1   Regensburg, Bavaria 87949 Applied Materials   Applied Materials   8300  Oxide Etchers in Single Chamber Plasma Tools APPLIED MATERIALS SYSTEM ELECTRONICS RACK: System Electronics Rack 1   Scotia, New York 114961 Advanced Plasma Syst   Advanced Plasma Syst   B Series-4  Barrel/Box Plasma Etchers in Plasma Etch Equipment APS MARCH B SERIES-4 PLASMA TREATMENT SYSTEM. : Plasma Treatment System Desmear/Etchback Advanced Plasma Systems and March Instruments, manufacturer of plasma systems, were aquired by Nordson. Both companies merged and are an entity of Nordson - now called Nordson MARCH. 1   F* Scotia, New York 189241 Branson/IPC   Branson/IPC   7102  Barrel/Box Plasma Etchers in Plasma Etch Equipment BRANSON TEPLA PVA PLASMA ETCHER 1000 WATT: Plasma Etcher 1   F* Scotia, New York 251432 Branson/IPC   Branson/IPC   Series 2000  Barrel/Box Plasma Etchers in Plasma Etch Equipment Branson/IPC Series 2000 Plasma Barrel Stripper: BRANSON/IPC Series 2000 Plasma Barrel Photoresist BRANSON/IPC S2005-11020Reactor Center with 10” (i.d.) X 20” (h) Quartz Chamber S2000C Controller with 2ea Rotometer Controlled Gas Channels ENI OEM-12 1000 Watt RF Generator 1   Plano, Texas 256750 LAM Research Corp.   LAM Research Corp.   Alliance 9400 PTX  Cluster Plasma Tools - Poly/Nitride in Cluster Plasma Tools LAM Alliance 9400 PTX: Mainframe with 3 Plasmachambers C-Upgrade in 2024 Mainframe and 2 Plasmachambers fully usable 1 Plasmachamber Hardware incomplete 1   N* Regensburg, Bavaria 255827 LAM Research Corp.   LAM Research Corp.   2300 Kiyo  Cluster Plasma Tools - Oxide in Cluster Plasma Tools Lam Kiyo Chamber L2301-B: Semiconductor ETC Chamber with RF Cart Incl. Gasbox and Rocker Valve in production until January 2023 1   Villach, Carinthia 252330 LAM Research Corp.   LAM Research Corp.   9600SE  Metal Etchers in Single Chamber Plasma Tools Lam Research 9600SE Rainbow Metal Etch Tool: Lam Research 9600SE Rainbow Metal Etch Tool Rainbow Configuration Includes Post-Etch PR Strip Chamber Envision Software Configured for 200mm Wafers Currently Running in Fab – 9/16/2024 1   Plano, Texas 34890 LAM Research Co   LAM Research Co   490 AUTO ETCH  Poly/Nitride Etchers in Single Chamber Plasma Tools LAM RESEARCH SIX INCH NITRIDE ETCHER: Six Inch Nitride Etcher Automated Cassette to Cassette single wafer etching. 1   F* Scotia, New York 108528 March Instruments   March Instruments   PM-600  Barrel/Box Plasma Etchers in Plasma Etch Equipment MARCH INSTRUMENTS BARREL PLASMA ETCHER 300 WATT: Barrel Plasma Etcher with Vacuum Pump March Instruments, manufacturer of plasma systems, was acquired by Nordson - called Nordson MARCH. 1   F* Scotia, New York 177136 March Instruments   March Instruments   PX-2400  Barrel/Box Plasma Etchers in Plasma Etch Equipment MARCH NORDSON BOX PLASMA ETCHER 1000 WATT 13.56 MHz: Box Plasma Etcher Applications "Gas plasma treatment provides a fast, efficient method for surface treatment and cleaning prior to wire bonding, die attach, encapsulation, conformal coating and other processes. Plasma processing enhances lamination bondstrength, improves wire bond strength and uniformity,promotes underfill adhesion and enhances die attach." Source -- March Nordson. 1   Scotia, New York 257351 March Instruments   March Instruments   PX-500  Barrel/Box Plasma Etchers in Plasma Etch Equipment MARCH NORDSON BOX PLASMA ETCHER 600 WATT 13.56 MHZ: Box Plasma Etcher 1   N* Scotia, New York 199963 March Instruments   March Instruments   PX-500  Barrel/Box Plasma Etchers in Plasma Etch Equipment MARCH NORDSON BOX PLASMA ETCHER 600 WATT 13.56 MHZ: Box Plasma Etcher 1   Scotia, New York 208462 Plasma-finish   Plasma-finish   V15G  Barrel/Box Plasma Etchers in Plasma Etch Equipment PLASMA-FINISH GMBH PLASMA ETCHER SYSTEM 300 WATT: Plasma Box Etcher System PINK GmbH acquired Plasma-Finish - now called PINK GmbH Plasma-Finish 1   Scotia, New York 225948 Plasma-Therm   Plasma-Therm   790  Etchers - Other in Single Chamber Plasma Tools Plasma-Therm 790 Reactive Ion Etcher - Remaufactured with ECT Upgrade: PLASMA-THERM 790 Reactive Ion Etcher; Serial Number PTI-78272F Manually Loaded Process Chamber with 8” (dia.) Cathode Gas Distribution Panel with 4ea Gas Channels MKS 1479 Metal Sealed Mass Flow Controllers 4ea Additional Gas Channels Available RFPP RF5S RF Generator: 500W @ 13.56MHz RFPP AMN-5 Auto Matching Network RFPP AMNPS-2A Auto Matching Network Controller Leybold TMP 361 Turbomolecular Pump Leybold NT 150/360 Turbomolecular Pump Controller EquipmentWorks 2.6 Application SW Industrial PC Running UBUNTU LINUX OS, Intel I7 CPU at 3.4 GHz,16Gb RAM & 500GB SSD All Analog & Digital I/O Modules Controlled by BECKHOFF Ethernet I/O Via Modbus TCP/IP Communications Protocol. All I/O Modules Available from BECKHOFF Automation and are Plug & Play Compatible All Pneumatic Valves Controlled by SMC Modules Via Modbus TCP/IP Communications Protocol All SMC Pneumatic Valves Available from SMC USA Standard 21” Flat Panel Monitor, Keyboard & Mouse Edwards QDP40 Dry Roughing Pump NESLAB HX-75 Chiller Electrical Disconnect Box - 208V, 60Hz, 3 Ph System Fully Refurbished & Ready for Demonstration Guaranteed to Meet or Exceed OEM Specifications Price……$ 80,000.00 USD 1 80,021.44 Plano, Texas 3011 Plasma-Therm   Plasma-Therm   Wafer Batch 740/740  Metal Etchers in Single Chamber Plasma Tools PLASMA-THERM DUAL PLASMA ETCH AND REACTIVE ION ETCH SYSTEM 200MM: Dual Plasma Etch and Reactive Ion Etch Processing Systems System consists of a process chamber, upper electrode (with gas feed), and substrate electrode.   1   Scotia, New York 4054 Plasma-Therm   Plasma-Therm   73/74  Metal Etchers in Single Chamber Plasma Tools PLASMA-THERM PECVD AND DUAL PLASMA ETCH/REACTIVE ION ETCH SYSTEM: Combination PECVD and Dual Plasma Etch/Reactive Ion Etch Processing Systems 1   Scotia, New York 251431 Plasma-Therm   Plasma-Therm   SLR-770  Etchers - Other in Single Chamber Plasma Tools PLASMA-THERM SLR 770 ICP Plasma Etcher: PLASMA-THERM SLR 770 Inductively Coupled Plasma Etcher Single Process Chamber with SLR (Shuttle Lock Transfer) Load Lock Manual Load with Load Lock Handling Currently Configured for 4” Wafers Ceramic Wafer Clamp with Helium Backside Cooling System Gas Distribution Box with 5ea Gas Channels ENI ACG-6 RF Generator: 600W @ 13.56MHz ENI Automatic Matching Network RFPP RF20M RF Generator: 2000W @ 2.0MHz RFPP Automatic Matching Network Six Zone Chamber Heater with Temperature Controller LEYBOLD 900 Turbo Pump with Mag 1000 Controller MKS ITR Ion Gauge Controller VAT Gate Valve with PM-5 Controller Mechanical Roughing Pump NESLAB HX-75 Chiller Electrical Disconnect Box - 208V, 60Hz, 3 phase 1   Plano, Texas 165893 PlasmaQuest   PlasmaQuest   6" Load-Lock  Silicon Etchers in Single Chamber Plasma Tools PlasmaQuest Microwave-ECR Plasma system: This 6-inch Load-Lock PlasmaQuest high density plasma tool was built for for plasma etching, but also offers potential as a unique PECVD deposition tool. Unique combo of permanent magnet and electromagnets for ECR (Electron Cyclotron Resonance) ECR-enhancement of microwave plasma. ECR operation in mTorr pressure range yields large area plasma processing capability for planar and low profile parts. Stage height adjustment range relative to core plasma activation volume enables high levels of ECR process enhancement (species activation). Originally equipped with a 1000W, but higher input power may be viable. Both "as is" sale as well as full refurbishment for etch and/or PECVD processing can be considered. Configured with 2 modules including power & controls rack and vacuum module. 1   Leominster, Massachusetts 206582 Plasma-Therm   Plasma-Therm   BT 6" RIE MF  Metal Etchers in Single Chamber Plasma Tools PLASMATHERM BatchTop VII REACTIVE ION ETCH SYSTEM 6": Reactive Ion Etch System BatchTop VII 1   Scotia, New York 45428 Plasma-Therm   Plasma-Therm   790 ICP  Poly/Nitride Etchers in Single Chamber Plasma Tools PLASMATHERM ICP PLASMA ETCHER: Inductively Coupled Plasma Etcher with 9.5 Inch Electrode 1   F* Scotia, New York 201152 Plasma-Therm   Plasma-Therm   790 RIE PECVD 11"  Etchers - Other in Single Chamber Plasma Tools PLASMATHERM RIE PECVD MOUNTED IN GLOVEBOX: Reactive Ion Etch / PECVD system mounted in glovebox with an intregrated air purfier O2 and H20 sensors on board. Both top and bottom electrodes can be powered sequentially. 1   Scotia, New York 142821 Plasma-Therm   Plasma-Therm   Unaxis 790  Etchers - Other in Single Chamber Plasma Tools PLASMATHERM UNAXIS DUAL CHAMBER SHUTTLE LOAD LOCK SYSTEM: Shuttle Load Lock System 1   Scotia, New York 84296 Surface Tech Sys   Surface Tech Sys   308 PC  Barrel/Box Plasma Etchers in Plasma Etch Equipment STS SURFACE TECHNOLOGY SYSTEMS BARREL PLASA ETCHER 600 WATT: Barrel Plasma Etcher 1   Scotia, NY 147500 Surface Tech Sys   Surface Tech Sys   MXP Multiplex ICP HR  Etchers - Other in Single Chamber Plasma Tools SURFACE TECHNOLOGY SYSTEMS MXP ICP HR: Chlorine Etcher - Year 2003 1   Scotia, New York 102178 Surface Tech Sys   Surface Tech Sys   MXP Multiplex ICP ASE HR  Silicon Etchers in Single Chamber Plasma Tools SURFACE TECHNOLOGY SYSTEMS STS SILICON ICP ETCHER: Silicon Etcher - Year 2003 1   Scotia, New York 184779 Technics   Technics   Micro Stripper -- Series 200  Metal Etchers in Single Chamber Plasma Tools TECHNICS PLASMA ETCHER 200 WATT 13.65 MHz: Technics Micro Stripper Series 200 Plasma System 1   F* Scotia, New York 181401 Tepla   Tepla   4011  Barrel/Box Plasma Etchers in Plasma Etch Equipment TEPLA PLASMA ETCHER 4000 WATT: Planar Plasma Etcher 1   F* Scotia, New York 119294 Trion Technology   Trion Technology   Oracle  Cluster Plasma Tools - Oxide in Cluster Plasma Tools TRION TECHNOLOGY DIELECTRIC CLUSTER TOOL: Dielectric Cluster Tool Trion Technology Oracle 1   F* Scotia, New York 126704 Ulvac   Ulvac   NE 7800 Ferroelectric Etcher  Cluster Plasma Tools - Metal in Cluster Plasma Tools ULVAC FERROELECTRIC ETCHER: Like New Condition System installed in October of 2007, decommission in Feburary of 2008. Used in a R&D application The Ulvac NE 7800 is a high-temperature, high-density plasma etching system utilizing an Inductive Super Magnetron source (ICP with magnetic field). The NE 7800 is a dual load locked, cassette to cassette system designed for both R&D and production applications. Outstanding metal etching process stability for Pt/Ir/magnetic films and difficult to etch materials such as FeRAM and MRAM devices.   1   F* Scotia, New York

*   Vendor Role: Mfr is Manufacturer; Sup is Supplier/Distributor; OEM is Original Equipment Manufacturer

NOTE:
   photo available
   reference document attached
  F* if the item is specially featured
  N* if the item is newly added, and/or
  R* if the item's price is recently reduced.

Items from the following manufacturers are offered under Plasma Etch Equipment: Advanced Plasma System, Inc., Applied Materials, Inc., Branson/IPC, LAM Research Corp., March Instruments, Plasma-finish Enterprise, Plasma-Therm, PlasmaQuest, Surface Technology Systems, Technics, Tepla, Trion Technology, Ulvac