Displaying 501-600 of 627 Page 1 2 3 4 5 6 7  |
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Item ID |
Photo |
Short Description |
Product Type / Details |
#
|
Price |
Notes |
Location |
Make |
Model |
|
|
$ |
|
 |
231656
|
SPI Supplies
|
SPI Supplies |
Plasma Prep III |
in Plasma Resist Strippers
SPI BENCHTOP PLASMA ETCHER 100 WATT:Solid State Plasma Etcher/Asher
|
1
|
|
6,501.74 |
 |
Scotia, New York |
|
 |
252586
|
LAM Research Corp.
|
LAM Research Corp. |
SEZ SP 203 |
in Wet Processing Equipment
Spin Etch Tool (8''tool):Spin Etch Tool (8''tool)
|
1
|
|
|
 |
Kulim, Kedah |
|
 |
38830
|
SRD ROTORS
|
SRD ROTORS |
in Plate Cleaners
|
19
|
|
|
|
Scotia, New York |
|
 |
1557
|
Stackpole
|
Stackpole |
N/A |
in Deposition Equipment
STACKPOLE GRAPHITE CRUCIBLES:Graphite Crucibles (2 sizes)
|
15
|
|
|
 |
Scotia, New York |
|
 |
148277
|
STAINLESS STEEL 32" TALL X 31.5" Dia. BELL JAR
|
STAINLESS STEEL 32" TALL X 31.5" Dia. BELL JAR |
in Deposition Equipment
STAINLESS STEEL 32" TALL X 31.5" Dia. BELL JAR:Stainless Steel Bell Jar
Bell Jar
|
1
|
|
|
 |
Scotia, New York |
|
 |
84296
|
Surface Tech Sys
|
Surface Tech Sys |
308 PC |
in Plasma Etch Equipment
STS SURFACE TECHNOLOGY SYSTEMS BARREL PLASA ETCHER 600 WATT:Barrel Plasma Etcher
|
1
|
|
|
 |
Scotia, NY |
|
 |
147500
|
Surface Tech Sys
|
Surface Tech Sys |
MXP Multiplex ICP HR |
in Single Chamber Plasma Tools
SURFACE TECHNOLOGY SYSTEMS MXP ICP HR:Chlorine Etcher - Year 2003
|
1
|
|
|
|
Scotia, New York |
|
 |
102178
|
Surface Tech Sys
|
Surface Tech Sys |
MXP Multiplex ICP ASE HR |
in Single Chamber Plasma Tools
SURFACE TECHNOLOGY SYSTEMS STS SILICON ICP ETCHER:Silicon Etcher - Year 2003
|
1
|
|
|
 |
Scotia, New York |
|
 |
249036
|
Suss MicroTec
|
Suss MicroTec |
ACS200 Gen3 |
in Photoresist Coaters
Suss ACS200 Gen3, sn: ACS300GEN2-001151, 300 mm:Suss ACS200 Gen3, sn: ACS300GEN2-001151, 300 mm Suss spray coater
|
1
|
|
|
 |
East Fishkill, New York |
|
 |
42108
|
Suss MicroTec
|
Suss MicroTec |
FALCON - ACS 200 |
in Photoresist Coater/Developers
SUSS MICROTEC FALCON ACS 200:Fully Automated High Throughput Coating, Developing Cluster System
System configured for Anti-reflective coating (A.R.C) and Ebeam Resist.
|
1
|
|
|
F* |
Scotia, New York |
|
 |
154092
|
Silicon Valley Group
|
Silicon Valley Group |
8136 |
in Photoresist Tools
SVG SILICON VALLEY GROUP SINGLE TRACK HOT PLATE OVEN:Single Track Hot Plate Oven
Silicon Valley Group 8136
|
1
|
|
|
 |
Scotia, New York |
|
 |
189865
|
Takatori
|
Takatori |
ATM-1100E |
in Wafer Fabrication Equipment
Takatori ATM-1100E Wafer Taper:Takatori ATM-1100E Wafer Taper - For up to 200mm Wafers
- Flat Screen Monitor
- Upgraded Cokmputer Control System
|
1
|
|
|
|
Plano, Texas |
|
 |
189868
|
Takatori
|
Takatori |
ATRM-2100 |
in Wafer Fabrication Equipment
Takatori ATRM-2100 Automatic Wafer Detaper:Takatori ATRM-2100 Automatic Wafer Detaper
|
1
|
|
|
|
Plano, Texas |
|
 |
189867
|
Takatori
|
Takatori |
ATRM-2100D |
in Wafer Fabrication Equipment
Takatori ATRM-2100D Automatic Wafer Detaper:Takatori ATRM-2100D Automatic Wafer Detaper - For up to 200mm Wafers
- Upgraded Control System
|
1
|
|
|
|
Plano, Texas |
|
 |
131377
|
Tamarack Scientific
|
Tamarack Scientific |
Contact Mask Exposure |
in Mask Aligners
Tamarack Scientific Mask Aligner:Contact Mask Exposure System
|
1
|
|
|
F* |
Plano, TX |
|
 |
203400
|
TDK-Lambda
|
TDK-Lambda |
ESS 404-37.5-2-1262 |
in Power Supplies
TDK LAMBDA ESS DC POWER SUPPLY 404V, 37.5A:DC Power Supply Unused Surplus
|
1
|
|
3,450.92 |
 |
Scotia, New York |
|
 |
185618
|
TDK-Lambda
|
TDK-Lambda |
GEN 12.5-120IS510 |
in Power Supplies
TDK LAMBDA GENESYS DC POWER SUPPLY 12.5 VOLT 120 AMP 1500 WATT:Programmable DC Power Supply
|
11
|
|
|
 |
Scotia, New York |
|
 |
190345
|
TDK-Lambda
|
TDK-Lambda |
GEN 600-17-IS510-3P208 |
in Power Supplies
TDK LAMBDA GENESYS DC POWER SUPPLY 600 VOLT 17 AMP 10000 W:Programmable DC Power Supply
|
1
|
|
|
 |
Scotia, New York |
|
 |
218706
|
TDK-Lambda
|
TDK-Lambda |
GEN 600-2.6IS510 |
in Power Supplies
TDK LAMBDA GENESYS DC POWER SUPPLY 600 VOLT 2.6 AMP 1500 WATT:Programmable DC Power Supply New Surplus -- Never Used
|
1
|
|
|
 |
Scotia, New York |
|
 |
151594
|
TDK-Lambda
|
TDK-Lambda |
GEN 30-25 |
in Power Supplies
TDK-LAMBDA Genesys DC POWER SUPPLY:DC Power Supply
|
1
|
|
|
 |
Scotia, New York |
|
 |
151595
|
TDK-Lambda
|
TDK-Lambda |
GEN 150-5 |
in Power Supplies
TDK-LAMBDA Genesys DC POWER SUPPLY:DC Power Supply
|
1
|
|
|
 |
Scotia, New York |
|
 |
152464
|
TDK-Lambda
|
TDK-Lambda |
GEN 300-17IS510 |
in Power Supplies
TDK-LAMBDA GENESYS DC POWER SUPPLY 5000 WATT:GENESYS DC Power Supply
|
1
|
|
|
F* |
Scotia, New York |
|
 |
184779
|
Technics
|
Technics |
Micro Stripper -- Series 200 |
in Single Chamber Plasma Tools
TECHNICS PLASMA ETCHER 200 WATT 13.65 MHz:Technics Micro Stripper Series 200 Plasma System
|
1
|
|
|
F* |
Scotia, New York |
|
 |
254475
|
Tel
|
Tel |
ACT12 |
in Photoresist Coaters
TEL ACT12, 300mm, s/n: E220523:
|
1
|
|
|
 |
Singapore, |
|
 |
254137
|
Tel
|
Tel |
ACT8 |
in Photoresist Coaters
TEL ACT8, 200mm, s/n: 9212090:
|
1
|
|
|
 |
Singapore, |
|
 |
250840
|
Tel
|
Tel |
ACT8 |
in Photoresist Coaters
TEL ACT8, 200mm, sn: 9100970:
|
1
|
|
|
 |
Singapore, |
|
 |
250841
|
Tel
|
Tel |
ACT8 |
in Photoresist Coaters
TEL ACT8, 200mm, sn: 9101054:
|
1
|
|
|
 |
Singapore, |
|
 |
250847
|
Tel
|
Tel |
ACT8 |
in Photoresist Coaters
TEL ACT8, 200mm, sn: 9101544:
|
1
|
|
|
 |
Singapore, |
|
 |
251748
|
Tel
|
Tel |
Alpha 303i |
in Plasma Processing Equipment
TEL Alpha 303i, 300mm, s/n: L000004Y5312:
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
250977
|
Tel
|
Tel |
ALPHA 8S |
in Plasma Processing Equipment
TEL ALPHA 8S, 200mm, s/n: 300009685211:
|
1
|
|
|
 |
Singapore, |
|
 |
250978
|
Tel
|
Tel |
ALPHA 8S |
in Plasma Processing Equipment
TEL ALPHA 8S, 200mm, s/n: A00009490054:
|
1
|
|
|
 |
Singapore, |
|
 |
251093
|
Tel
|
Tel |
Alpha-303i |
in Plasma Processing Equipment
TEL Alpha-303i, sn: L000005X5343, 300mm:
|
1
|
|
|
 |
Singapore, |
|
 |
251094
|
Tel
|
Tel |
Alpha-303i |
in Plasma Processing Equipment
TEL Alpha-303i, sn: L000005X5346, 300mm:
|
1
|
|
|
 |
Singapore, |
|
 |
254125
|
Tel
|
Tel |
ALPHA-808S |
in Plasma Processing Equipment
TEL ALPHA-808S, 200mm, s/n: 3000095Z5344:
|
1
|
|
|
 |
Singapore, |
|
 |
254133
|
Tel
|
Tel |
ALPHA-808S |
in Plasma Processing Equipment
TEL ALPHA-808S, 200mm, s/n: 3000095Z5347:
|
1
|
|
|
 |
Singapore, |
|
 |
254128
|
Tel
|
Tel |
ALPHA-808S |
in Plasma Processing Equipment
TEL ALPHA-808S, 200mm, s/n: 300009615018:
|
1
|
|
|
 |
Singapore, |
|
 |
254129
|
Tel
|
Tel |
ALPHA-808S |
in Plasma Processing Equipment
TEL ALPHA-808S, 200mm, s/n: 300009665205:
|
1
|
|
|
 |
Singapore, |
|
 |
254130
|
Tel
|
Tel |
ALPHA-808S |
in Plasma Processing Equipment
TEL ALPHA-808S, 200mm, s/n: 300009675210:
|
1
|
|
|
 |
Singapore, |
|
 |
251089
|
Tel
|
Tel |
ALPHA-808S |
in Plasma Processing Equipment
TEL ALPHA-808S, sn: 3000095Z5346, 200mm:
|
1
|
|
|
 |
Singapore, |
|
 |
254135
|
Tel
|
Tel |
ALPHA-808SC |
in Plasma Processing Equipment
TEL ALPHA-808SC, 200mm, s/n: A00009490049:
|
1
|
|
|
 |
Singapore, |
|
 |
254127
|
Tel
|
Tel |
ALPHA-808SC |
in Plasma Processing Equipment
TEL ALPHA-808SC, 200mm, s/n: A00009490053:
|
1
|
|
|
 |
Singapore, |
|
 |
254136
|
Tel
|
Tel |
ALPHA-808SC |
in Plasma Processing Equipment
TEL ALPHA-808SC, 200mm, s/n: A00009520015:
|
1
|
|
|
 |
Singapore, |
|
 |
254131
|
Tel
|
Tel |
ALPHA-8S-D |
in Plasma Processing Equipment
TEL ALPHA-8S-D, 200mm, s/n: 300009615020:
|
1
|
|
|
 |
Singapore, |
|
 |
254132
|
Tel
|
Tel |
ALPHA-8S-Z |
in Plasma Processing Equipment
TEL ALPHA-8S-Z, 200mm, s/n: A00009520013:
|
1
|
|
|
 |
Singapore, |
|
 |
254134
|
Tel
|
Tel |
ALPHA-8S-Z |
in Plasma Processing Equipment
TEL ALPHA-8S-Z, 200mm, s/n: A00009520017:
|
1
|
|
|
 |
Singapore, |
|
 |
254126
|
Tel
|
Tel |
ALPHA-8S-Z |
in Plasma Processing Equipment
TEL ALPHA-8S-Z, 200mm, s/n: A00009815080:
|
1
|
|
|
 |
Singapore, |
|
 |
251090
|
Tel
|
Tel |
ALPHA-8S-Z |
in Plasma Processing Equipment
TEL ALPHA-8S-Z, sn: A000096Y5132, 200mm:
|
1
|
|
|
 |
Singapore, |
|
 |
250314
|
Tel
|
Tel |
ALPHA-8S-Z |
in Plasma Processing Equipment
TEL ALPHA-8S-Z, sn: A00009795483, 200mm:
|
1
|
|
|
 |
Singapore, |
|
 |
257154
|
Tel
|
Tel |
FORMULA-1S-H |
in Plasma Processing Equipment
TEL FORMULA, 300mm, s/n: P00000445027:
|
1
|
|
|
 |
Singapore, |
|
 |
257155
|
Tel
|
Tel |
FORMULA-1S-H |
in Plasma Processing Equipment
TEL FORMULA, 300mm, s/n: P000008X5073:
|
1
|
|
|
 |
Singapore, |
|
 |
257156
|
Tel
|
Tel |
FORMULA-1S-H |
in Plasma Processing Equipment
TEL FORMULA, 300mm, s/n: P00001055059:
|
1
|
|
|
 |
Singapore, |
|
 |
254477
|
Tel
|
Tel |
LITHIUS PRO-I |
in Photoresist Coaters
TEL LITHIUS PRO-I, 300mm, s/n: N150752:
|
1
|
|
|
 |
Singapore, |
|
 |
254106
|
Tel
|
Tel |
Lithius ProV |
in Photoresist Coaters
TEL Lithius ProV, 300mm, s/n: MDV120316:
|
1
|
|
|
 |
Malta, New York |
|
 |
254101
|
Tel
|
Tel |
Lithius ProVi |
in Photoresist Coaters
TEL Lithius ProVi, 300mm, s/n: V110231:Immersion Coat and Develop
|
1
|
|
|
 |
Malta, New York |
|
 |
254102
|
Tel
|
Tel |
Lithius ProVi |
in Photoresist Coaters
TEL Lithius ProVi, 300mm, s/n: V110233:Immersion Coat and Develop
|
1
|
|
|
 |
Malta, New York |
|
 |
254103
|
Tel
|
Tel |
Lithius ProVi |
in Photoresist Coaters
TEL Lithius ProVi, 300mm, s/n: V120318:Immersion Coat and Develop
|
1
|
|
|
 |
Malta, New York |
|
 |
254240
|
Tel
|
Tel |
Lithius ProVi |
in Photoresist Coaters
TEL Lithius ProVi, 300mm, s/n: V120377:
|
1
|
|
|
 |
Malta, New York |
|
 |
255441
|
Tel
|
Tel |
LITHIUS |
in Photoresist Coaters
TEL LITHIUS, 300mm, s/n: MD-G360588:
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
257159
|
Tel
|
Tel |
LITHIUS |
in Photoresist Coaters
TEL LITHIUS, 300mm, s/n: MD-G360588:2-Block-Machine
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
257160
|
Tel
|
Tel |
LITHIUS |
in Photoresist Coaters
TEL LITHIUS, 300mm, s/n: MD-G360844:2-Block-Machine
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
255442
|
Tel
|
Tel |
LITHIUS |
in Photoresist Coaters
TEL LITHIUS, 300mm, s/n: MD-G360844:
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
255443
|
Tel
|
Tel |
LITHIUS |
in Photoresist Coaters
TEL LITHIUS, 300mm, s/n: MDG360846:
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
257161
|
Tel
|
Tel |
LITHIUS |
in Photoresist Coaters
TEL LITHIUS, 300mm, s/n: MDG360846:2-Block-Machine
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
251087
|
Tel
|
Tel |
MARK8 |
in Photoresist Coaters
TEL MARK8, 200mm, s/n: 8181620:
|
1
|
|
|
 |
Singapore, |
|
 |
250488
|
Tel
|
Tel |
MK7-S |
in Lithography Equipment
TEL MK7-S Coater_Developer:missing parts: 2 resist pumps, 1Developer Line Add. Info: TYP A1 M/C Typ FC-9801F#1 SD/HD Typ Commandpost System Vers. MK8G2.38 Alarm File ALM00166.OEN Sp. Al.File AL00TT.OEN GEM 1.72 Lines 1(3) Pumps 1xmini EBR programable T/H-Controller Semifab CD200 Backrinse yes Lines 1 x H-Nozzle Rinse yes Backrinse yes Last Time in production 1/1/24
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
250489
|
Tel
|
Tel |
MK7-S |
in Lithography Equipment
TEL MK7-S Coater_Developer:missing parts: 2 resist pumps, 1Developer Line Add. Info: TYP A M/C Typ FC-9801F#1 SD/HD Typ Commandpost System Vers. MK8G2.38 Alarm File ALM00166.OEN Sp. Al.File AL00TT.OEN GEM 1.72 Lines 1(3) Pumps 1xmini EBR programable T/H-Controller Semifab CD200 Backrinse yes Lines 1 x H-Nozzle Rinse yes Backrinse yes Last Time in production 1/1/24
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
250490
|
Tel
|
Tel |
MK7-S |
in Lithography Equipment
TEL MK7-S Coater_Developer:missing parts: 2 resist pumps, 1Developer Line Add. Info: TYP A M/C Typ FC-9801F#1 SD/HD Typ Commandpost System Vers. MK8G2.38 Alarm File ALM00166.OEN Sp. Al.File AL00TT.OEN GEM 1.72 Lines 1(3) Pumps 1xmini EBR programable T/H-Controller Semifab CD200 Backrinse yes Lines 1 x H-Nozzle Rinse yes Backrinse yes
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
250491
|
Tel
|
Tel |
MK7-S |
in Lithography Equipment
TEL MK7-S Coater_Developer:missing parts: 2 resist pumps, 1Developer Line Add. Info: TYP A M/C Typ FC-9801F#2 SD/HD Typ Commandpost System Vers. MK8G2.38 Alarm File ALM00166.OEN Sp. Al.File AL00TT.OEN GEM 1.72 Lines 1(3) Pumps 1xmini EBR programable T/H-Controller Shinwa CP-I Backrinse yes Lines 1 x H-Nozzle Rinse yes Backrinse yes Last time in production: 01.01.24
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
254104
|
Tel
|
Tel |
PROi |
in Photoresist Coaters
TEL PROi, 300mm, s/n: N100355:Cot / DEV
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
257162
|
Tel
|
Tel |
ProZ |
in Photoresist Coaters
TEL ProZ, 300mm, s/n: Z111637:
|
1
|
|
|
 |
Malta, New York |
|
 |
254241
|
Tel
|
Tel |
ProZ |
in Photoresist Coaters
TEL ProZ, 300mm, s/n: Z111638:
|
1
|
|
|
 |
Malta, New York |
|
 |
249576
|
Tel
|
Tel |
SYNAPSE V BONDER |
in Plasma Processing Equipment
TEL SYNAPSE V BONDER, 300mm, s/n: B120008:
|
1
|
|
|
 |
East Fishkill, New York |
|
 |
253233
|
Tokyo Electron Ltd
|
Tokyo Electron Ltd |
Tactras Vigus |
in Chemical Vapor Deposition Equipment
TEL Tactras Vigus, s/n: NA:TEL Tactras Vigus LK3
|
1
|
|
|
|
Dresden, Saxony |
|
 |
250592
|
Tel
|
Tel |
TELIUS |
in Plasma Processing Equipment
TEL TELIUS, 300mm, sn: H01777, FA02 TEL Telius Poly-T4 ATCC:
|
1
|
|
|
 |
East Fishkill, New York |
|
 |
254120
|
Tel
|
Tel |
U2E-855DD |
in Plasma Processing Equipment
TEL U2E-855DD, 200mm, U00769:UNITY 2E OXIDE ETCHER
|
1
|
|
|
 |
Singapore, |
|
 |
249038
|
Tel
|
Tel |
Indy IRAD |
in LPCVD Furnaces
TEL, Indy IRAD, 300mm, s/n: R00000895110, TEL Furnace:TEL, Indy IRAD, 300mm, s/n: R00000895110, TEL Furnace
|
1
|
|
|
 |
East Fishkill, New York |
|
 |
249039
|
Tel
|
Tel |
Indy IRAD |
in LPCVD Furnaces
TEL, Indy IRAD, 300mm, s/n: R00001065058, TEL NIT HIK FURNACE:TEL, Indy IRAD, 300mm, s/n: R00001065058, TEL NIT HIK FURNACE
|
1
|
|
|
 |
East Fishkill, New York |
|
 |
249204
|
Tokyo Electron Limit
|
Tokyo Electron Limit |
LITHIUS I+ |
in Photoresist Coaters
TEL, LITHIUS I+, 300mm, S/N G481358:TEL, LITHIUS I+, 300mm, S/N G481358
|
1
|
|
|
 |
Singapore, |
|
 |
233207
|
Tokyo Electron Ltd
|
Tokyo Electron Ltd |
Lithius |
in Photoresist Coaters
TEL, Lithius, 300mm, S/N G260815:TEL, Lithius, 300mm, S/N G260815
|
1
|
|
|
 |
Singapore, |
|
 |
245289
|
Tokyo Electron Limit
|
Tokyo Electron Limit |
8181523 |
in Photoresist Coaters
TEL, Mark 8, 200mm, S/N 8181523:TEL, Mark 8, 200mm, S/N 8181523 SOG Coater. 2 coaters only.
|
1
|
|
|
 |
Singapore, |
|
 |
212329
|
Telemark
|
Telemark |
914-1110-000 |
in Power Supplies
TELEMARK ION BEAM POWER SUPPLY:Ion Beam Power Supply
|
1
|
|
|
 |
Scotia, New York |
|
 |
229914
|
Telemark
|
Telemark |
TT-3 |
in Deposition Equipment
Telemark TT-3 Electron Beam Power Supply :Telemark TT-3 Electron Beam Power Supply - XY Sweep, Serial Number NE44368
|
1
|
|
|
 |
Plano, Texas |
|
 |
83849
|
Telemark
|
Telemark |
XY SWEEP |
in Deposition Equipment
TELEMARK XY SWEEP CONTROL:XY Sweep Control
|
3
|
|
1,950.52 |
 |
Scotia, New York |
|
 |
244096
|
Temescal
|
Temescal |
BJD-1800 |
in Deposition Equipment
Temescal BJD-1800 Electron Beam Evaporator:TEMESCAL BJD-1800 Electron-Beam Evaporator - PLC/PC Based Control System
- TEMESCAL Simba 2 E-Beam Power Supply
- TEMESCAL Programmable Sweep Controller
- TEMESCAL Six Pocket E-Beam Source with 15cc Crucible Pockets
- TEMESCAL TRC-3460 Turret Rotation Controller
- INFICON XTC-2 Deposition Controller
- GRANVILLE-PHILLIPS Mini-Convectron Gauges
- GRANVILLE-PHILLIPS Mini-Ion Gauges
- CTI CryoTorr 8 Cryogenic Vacuum Pump
- CTI Water Cooled Compressor
- 18” (i.d.) Stainless Steel Chamber with Motorized Lift
- Hinged Chamber Lid
- Factory Shielding Set Included
- TEMESCAL Lift-Off Fixturing for 3” & 4” Wafers – 2ea Sets Each
- EDWARDS QDP40 Dry Vacuum Pump
- Complete System Refurbishment Included
- Delivery: 6-8 Weeks
- ………….…………………………………………………………….….$110,000.00
- Pictures on Website are Before Refurbishment
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1
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|
110,029.48 |
 |
Mountain View, California |
|
 |
87979
|
Temescal
|
Temescal |
BJD-1800 |
in Deposition Equipment
TEMESCAL E-BEAM EVAPORATOR, 6 POCKET:E Beam Evaporator
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1
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|
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F* |
Scotia, New York |
|
 |
43846
|
Temescal
|
Temescal |
BJD 1800 |
in Deposition Equipment
TEMESCAL E-BEAM EVAPORATOR, 6 POCKET:E Beam Evaporator
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1
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F* |
Scotia, New York |
|
 |
155233
|
Temescal
|
Temescal |
CV12SL |
in Power Supplies
TEMESCAL ELECTRON BEAM POWER SUPPLY:Electron Beam Power Supply
Temescal CV12SL
|
1
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|
|
 |
Scotia, New York |
|
 |
52623
|
Airco Temescal
|
Airco Temescal |
BJD-1800 |
in Deposition Equipment
TEMESCAL FILAMENT EVAPORATOR:Filament Evaporator
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1
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|
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F* |
Scotia, New York |
|
 |
40300
|
Temescal
|
Temescal |
VES-2550 |
in Deposition Equipment
TEMESCAL HIGH VOLUME E BEAM EVAPORATOR, SIX POCKET:High Volume E Beam Evaporator
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1
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|
F* |
Scotia, New York |
|
 |
181401
|
Tepla
|
Tepla |
4011 |
in Plasma Etch Equipment
TEPLA PLASMA ETCHER 4000 WATT:Planar Plasma Etcher
|
1
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|
|
F* |
Scotia, New York |
|
 |
81501
|
Terra Universal
|
Terra Universal |
|
in Wet Processing Equipment
Terra Universal:8 Tank Stainless Steel Sink
|
1
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|
 |
Plano, TX |
|
 |
50992
|
Canary Technology
|
Canary Technology |
CT 3533-130 |
in Diffusion Furnaces
THERMCO/TEMPRESS TUBE FURNACE:Six Pack Tube Furnace consisting of one three stack 4" capable and one 6" capable three stack furnace
Two three stack Thermco furnace banks sharing one laminar flow, bulk head mount, manual pull station with Tempress Model 263 Controllers. Left side bank was refurbished and upgraded(Canary Tech.) to 150mm capable MRL Black Max heating elements with one year of use. Furnace will be sold AS IS WHERE IS
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1
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F* |
Scotia, New York |
|
 |
179042
|
Trek Inc
|
Trek Inc |
PA1208A |
in Power Supplies
TREK ELECTROSTATIC CHUCK POWER SUPPLY:Ion Implanter OEM Specific High Voltage Power Supply for ESC (Electrostatic Chuck)
|
2
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|
|
F* |
Scotia, New York |
|
 |
119294
|
Trion Technology
|
Trion Technology |
Oracle |
in Cluster Plasma Tools
TRION TECHNOLOGY DIELECTRIC CLUSTER TOOL:Dielectric Cluster Tool
Trion Technology Oracle
|
1
|
|
|
F* |
Scotia, New York |
|
 |
237878
|
Accretech
|
Accretech |
UF3000EX-e |
in Wafer Fabrication Equipment
TSK-Prober 209:Probertyp | UF3000EX-e | Hinge Manipulator | No | Type of tester head plate | Agilent | Prober power supply rate | 230V | Chuck Type (Nickel, Gold, etc.) | Gold, Plane, Bernoulli | | | Network/connection | Yes | APCC Auto Probe Card Changer | No | Top Side Handling | Yes, V1 mit Bernoulli | Cleaning pad module | Yes |
The Prober is sold without the hinge!! (marked red in the picture)
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1
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|
 |
Villach, Carinthia |
|
 |
126704
|
Ulvac
|
Ulvac |
NE 7800 Ferroelectric Etcher |
in Cluster Plasma Tools
ULVAC FERROELECTRIC ETCHER:Like New Condition System installed in October of 2007, decommission in Feburary of 2008. Used in a R&D application
The Ulvac NE 7800 is a high-temperature, high-density plasma etching system utilizing an Inductive Super Magnetron source (ICP with magnetic field). The NE 7800 is a dual load locked, cassette to cassette system designed for both R&D and production applications. Outstanding metal etching process stability for Pt/Ir/magnetic films and difficult to etch materials such as FeRAM and MRAM devices.
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1
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F* |
Scotia, New York |
|
 |
104053
|
Unknown OEM*
|
Unknown OEM* |
006790 |
in Power Supplies
Unknown Part Number 006790:Power Supply 5V 35A
|
2
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|
57.52 |
|
Hudson, NY |
|
 |
115713
|
Unknown Mfr*
|
Unknown Mfr* |
35-438-01 |
in Power Supplies
Unknown Part Number 35-438-01:Supply Power CRT Low Voltage
|
1
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|
|
|
Hudson, NY |
|
 |
57081
|
Unknown Mfr*
|
Unknown Mfr* |
405-122-00 |
in Power Supplies
Unknown Part Number 405-122-00:Other Power Supplies in Power SuppliesPOWER SUPPLY, 65A/20A,8V/12V-R
|
1
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|
|
|
Hudson, NY |
|
 |
57080
|
Unknown Mfr*
|
Unknown Mfr* |
EFX 100T-1 |
in Power Supplies
Unknown Part Number EFX 100T-1:Other Power Supplies in Power SuppliesPOWER SUPPLY, 5V@8A/24V@.5A
|
1
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|
Hudson, NY |
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